2005
DOI: 10.1007/s00339-004-2979-1
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Crystallization of (Bi,Nd)4Ti3O12 films in N2 environment by chemical solution deposition

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Cited by 3 publications
(2 citation statements)
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“…The structures of the films were characterized by x-ray diffraction ͑XRD͒ using a D/max-rA x-ray diffractometer with Cu K␣ radiation and scanning electron microscope ͑SEM͒. 15,16 This may be attributed to the increase in c-oriented degree of films with increasing annealing temperature. To measure the electrical properties, Au dot electrodes with diameter of 200 m were deposited on the top surface of the films by dc sputtering through a shadow mask.…”
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confidence: 99%
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“…The structures of the films were characterized by x-ray diffraction ͑XRD͒ using a D/max-rA x-ray diffractometer with Cu K␣ radiation and scanning electron microscope ͑SEM͒. 15,16 This may be attributed to the increase in c-oriented degree of films with increasing annealing temperature. To measure the electrical properties, Au dot electrodes with diameter of 200 m were deposited on the top surface of the films by dc sputtering through a shadow mask.…”
mentioning
confidence: 99%
“…To measure the electrical properties, Au dot electrodes with diameter of 200 m were deposited on the top surface of the films by dc sputtering through a shadow mask. 9,10,15,16 This can be understood as follows. The dielectric measurements were performed using an HP4194A impedance analyzer.…”
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confidence: 99%