2004
DOI: 10.1016/j.jnucmat.2004.04.206
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Crystallization behavior of arc-deposited ceramic barrier coatings

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Cited by 57 publications
(26 citation statements)
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“…Oxygen was introduced into the main chamber, forming an Er 2 O 3 coating. During the deposition RF-induced bias voltages of -150 V was applied on the sample to enhance crystallinity [11]. 1.4 μm thick coatings were deposited on one side or both sides of the substrate.…”
Section: Coating Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…Oxygen was introduced into the main chamber, forming an Er 2 O 3 coating. During the deposition RF-induced bias voltages of -150 V was applied on the sample to enhance crystallinity [11]. 1.4 μm thick coatings were deposited on one side or both sides of the substrate.…”
Section: Coating Methodsmentioning
confidence: 99%
“…For the examination of protium concentration, a nuclear reaction of H( 15 N, γα) 12 C was performed by a tandem-type Van der Graf accelerator at the Micro Analysis Laboratory, Tandem accelerator (MALT) at the University of Tokyo [11]. The protium concentration was determined via γ-ray intensity using a semiconductor detector.…”
Section: Measurement Of Hydrogen Isotope Concentration Distribution Bmentioning
confidence: 99%
“…15) Feasibility of the coating with Er 2 O 3 and Y 2 O 3 on V-4Cr-4Ti was demonstrated by EB-PVD, 15) Arc Source Plasma Deposition 46) and RF sputtering. 47) In addition to the physical deposition methods, in-situ coating with Er 2 O 3 on V-4Cr-4Ti is being developed.…”
Section: Mhd Coating Developmentmentioning
confidence: 99%
“…About 1 μm Er 2 O 3 film is deposited by a filtered arc deposition device described in [13] and [16]. A schematic view of the device is shown in Fig.…”
Section: Deposition Of Er 2 O 3 Coatingmentioning
confidence: 99%