Crystallization and ablation in annealing of amorphous-Si thin film on glass and crystalline-Si substrates irradiated by third harmonics of Nd3+:YAG laser

Influence of Nd³⁺:YAG Laser Beam Profiles on Annealing and Nano-Texturing of Amorphous-Silicon Thin Films

“…:YAG laser is also investigated [7,8]. Nd 3+ :YAG laser with the second (532 nm) and the third (355 nm) harmonics can be considered for the treatment of a-Si and related films, which will allow annealing up to few hundreds of nm depth.…”

Simulation of nanosecond IR laser annealing of cerium gadolinium oxide

“…Laser annealing is a technique that allows localized modifications to the materials without affecting the entire structure [10,11]. This technique has been employed successfully to treat ceramic materials with an increasing interest in their densification [12][13][14][15][16][17][18] and it has been demonstrated that pulsed laser irradiation offers an attractive alternative to conventional thermal annealing for oxides densification [11,12].…”

Phase Transformation and Optical Properties of Annealed Hydrothermally Synthesized ZnO/ZnCr2O4 Nanocomposites

“…However, ZnO nanostructures grown by hydrothermal technique were observed to be prone higher defect density. To passivate the defect density in semiconductors, there are various techniques such as metal coating, H 2 O 2 wash; Ozone treatment and annealing are used by various research groups . Here, postgrowth thermal annealing has been used to systematically modulate the defect density because annealing does not required any specific set up and applicable for all type of samples powder as well as thin film …”