2009
DOI: 10.1002/pssc.200881184
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Crystal structure and surface morphology of the Ba0.7Sr0.3TiO3 thin films deposited by pulsed laser deposition

Abstract: Ba0.7Sr0.3TiO3 (BST) thin films have been deposited on Si substrates under two different temperatures (200 °C and 450 °C) by pulsed laser deposition (PLD) technique. The structural characterization of the BST thin films was performed by X‐ray diffraction (XRD) and the surface morphology was explored by atomic force microscopy (AFM). All films were found to be crystalline with preferred (100) plane orientation. The diffraction patterns from XRD analysis are attributed to cubic perovskite structure. Annealing di… Show more

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“…[1] Specially, Barium strontium titanate (Ba 1−x Sr x TiO 3 , BST) has been investigated with considerable interest as a dielectric material for its large fielddependent permittivity, high dielectric constant and relatively low loss tangent. At present, BST thin films have been prepared by a variety of techniques such as radio frequency magnetron sputtering, [2,3] pulsed laser deposition, [4] metal organic chemical vapour deposition, [5,6] and chemical solution deposition (CSD). [7,8] Among these methods, the CSD method has been used widely in processing the thin films because of its various advantages such as chemical homogeneity, low cost, accuracy of stoichiometry control and especially the convenience of large area deposition.…”
Section: Introductionmentioning
confidence: 99%
“…[1] Specially, Barium strontium titanate (Ba 1−x Sr x TiO 3 , BST) has been investigated with considerable interest as a dielectric material for its large fielddependent permittivity, high dielectric constant and relatively low loss tangent. At present, BST thin films have been prepared by a variety of techniques such as radio frequency magnetron sputtering, [2,3] pulsed laser deposition, [4] metal organic chemical vapour deposition, [5,6] and chemical solution deposition (CSD). [7,8] Among these methods, the CSD method has been used widely in processing the thin films because of its various advantages such as chemical homogeneity, low cost, accuracy of stoichiometry control and especially the convenience of large area deposition.…”
Section: Introductionmentioning
confidence: 99%