2015
DOI: 10.1021/acs.langmuir.5b03151
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Crystal Perfection of Particle Monolayer at the Air–Water Interface

Abstract: Crystal growth in colloidal particle monolayers fabricated by Langmuir-Blodgett method on 4 in. sapphire wafers was investigated under the condition of two techniques, that is, ultrasonic annealing at 1.2 to 1.5 MHz and barrier-sway process at 0.2 to 0.5 Hz. Significant increases of the ordered area were obtained by the both techniques and more than 60 times growth was confirmed. The remaining crystal defects after the growth were categorized as grain boundary, vacancy, and line defect. Both techniques exhibit… Show more

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Cited by 35 publications
(28 citation statements)
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“…The self‐assemble process is shown as the following series of steps: (i) presetting the substrates underneath the water and connecting the injectors with the MPI system (Figure B(a)); (ii) self‐assembly of colloidal PS nanospheres on the water surface fabricated via the MPI system (Figure B(b)); (iii) formation of a dense self‐assembled PS monolayer consisting of colloidal crystals on the entire water surface (Figure B(c)); transferring of PS monolayer onto the preset substrates (Figure B(d)). In order to decrease the defect concentration of the MCCs fabricated by LB method, two different techniques of the ultrasonic annealing and the barrier‐sway can be employed as illustrated in Figure C . The setup of “ultrasonic annealing” is consisted of an ultrasonic generator and a transducer.…”
Section: Controllable Self‐assembly Of Colloidal Spheressupporting
confidence: 89%
See 1 more Smart Citation
“…The self‐assemble process is shown as the following series of steps: (i) presetting the substrates underneath the water and connecting the injectors with the MPI system (Figure B(a)); (ii) self‐assembly of colloidal PS nanospheres on the water surface fabricated via the MPI system (Figure B(b)); (iii) formation of a dense self‐assembled PS monolayer consisting of colloidal crystals on the entire water surface (Figure B(c)); transferring of PS monolayer onto the preset substrates (Figure B(d)). In order to decrease the defect concentration of the MCCs fabricated by LB method, two different techniques of the ultrasonic annealing and the barrier‐sway can be employed as illustrated in Figure C . The setup of “ultrasonic annealing” is consisted of an ultrasonic generator and a transducer.…”
Section: Controllable Self‐assembly Of Colloidal Spheressupporting
confidence: 89%
“…Setup “B”: Barrier‐sway process to the particle monolayer. Reproduced with permission . Copyright 2015, American Chemical Society.…”
Section: Controllable Self‐assembly Of Colloidal Spheresmentioning
confidence: 99%
“…When combined with other fabrication methods, PS monolayers prepared by MPI can be utilized as colloidal lithography masks to produce various nanophotonic texturing on c‐Si thin films . Moreover, the ultrasonic annealing and the capillary can assist the self‐assembly of nanospheres, increasing the area of crystal domains . Especially, Park et al have developed a simple and cost‐efficient process of unidirectional rubbing to assemble spherical particles into a single‐crystal monolayer on a flat or curved substrate.…”
Section: Tailoring Ordered Photonic Micro/nanostructurementioning
confidence: 99%
“…Similarly, a gravity‐assisted convective self‐assembly method was developed to fabricate centimeter‐sized uniform 2D colloidal crystals . A large‐area self‐assembly of nanospheres can also be obtained via ultrasonic annealing and barrier‐sway process, a low‐cost micropropulsive injection method and capillary‐modulated self‐assembly . Besides, assembled monolayers of hydrophilic particles on water surfaces was investigated .…”
Section: New Development In Colloidal Crystal Masks and Applicationsmentioning
confidence: 99%