Crystal oscillator film thickness monitor

Muggleton, A.H.F.; Howe, F.A.

doi:10.1016/0029-554x(64)90429-x

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Vacuum Deposition1

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1968

2013

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Cited by 12 publications

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“…Behrandt and Love [ 63 ] found that frequency shifts due to temperature variations of the crystal can be reduced using a cooled holder and reported the construction of a device monitoring the deposition rate. In 1964 Muggeleton and Howe [ 64 ] reported the construction of the set-up able to monitor the thickness of a deposited film and the rate of the process. In the following the Quartz Crystal Thickness Monitor has been improved to eliminate measurement errors due to temperature effects and mechanical shocks and became widely used in thin film deposition processes.…”

Section: Vacuum Depositionmentioning

confidence: 99%