2016
DOI: 10.1021/acs.cgd.6b00824
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Crystal Growth and Photoluminescence Properties of Reactive CVD-Derived Monoclinic Hafnium Dioxide

Abstract: Here we report the first synthesis of large-size (up to 2 cm), transparent, high-purity monoclinic HfO2 single crystals by reactive chemical vapor deposition (RCVD) using CF4 as a transport agent at 1000 °C. The single crystals were comprehensively characterized in terms of their phase and elemental composition, as well as morphology by the modern analytical techniques. Thermodynamic modeling of the Hf–C–Si–O–F heterogeneous system was undertaken to understand in detail the chemical equilibria that occur in th… Show more

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Cited by 14 publications
(9 citation statements)
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“…First, these are monolithic ceramics based on hafnium-containing compounds such as HfC, HfN, and HfB 2 . The product of the oxidation of these compounds is hafnium dioxide, which is among the most refractory oxides and has the lowest vapor pressure at T = 2400 K ( P = 1.5 × 10 –7 atm , ). Much attention was also paid to the research and development of the materials based on HfB 2 or ZrB 2 in conjunction with SiC. They were identified as the most appropriate oxidation-resistant refractory materials at temperatures above 1800 °C. , …”
Section: Introductionmentioning
confidence: 99%
“…First, these are monolithic ceramics based on hafnium-containing compounds such as HfC, HfN, and HfB 2 . The product of the oxidation of these compounds is hafnium dioxide, which is among the most refractory oxides and has the lowest vapor pressure at T = 2400 K ( P = 1.5 × 10 –7 atm , ). Much attention was also paid to the research and development of the materials based on HfB 2 or ZrB 2 in conjunction with SiC. They were identified as the most appropriate oxidation-resistant refractory materials at temperatures above 1800 °C. , …”
Section: Introductionmentioning
confidence: 99%
“…According to calculations [37,38], oxygen vacancies in positions of O 3f and O 4f in different charge states create additional energy levels in the forbidden gap, and corresponding optical transitions involve in forming spectral features of the OA spectrum. At hν > 5.5 eV, a sharp increase in absorption corresponds to the region of the intrinsic absorption edge, which is typical for the monoclinic hafnium dioxide [5,9,13,17,20,23,28,29,39] and quite coincides with the excitation energy of STE (see Figures 3 and 4).…”
Section: Estimation Of the Bandgapmentioning
confidence: 59%
“…Thus, it can be inferred that the intrinsic absorption edge in nominally pure hafnium dioxide is formed by direct and indirect allowed band-to-band transitions alike. The possibility of simultaneous realization of two types of optical transitions has been previously revealed in thin films [9,20] and m-HfO 2 single crystals [13]. According to [41,42] an indirect allowed transition occurs between the points Γ → Β of the Brillouin zone, and the direct one corresponds to the process Γ → Γ.…”
Section: Estimation Of the Bandgapmentioning
confidence: 98%
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“…The emission peaks located at 568 and 577 nm lying in yellow or green region arise when excited electrons relax directly from 4 G 5/2 to 6 H 5/2 , ground state, whereas peaks in the wavelength range of 597–617 nm in near red region appear due to electronic transition, 4 G 5/2 → 6 H 5/2 . Additionally, one can notice a sharp peak at 557 nm predominantly associated to transitions occurring from different defect levels within the host, HfO 2 …”
Section: Resultsmentioning
confidence: 98%