“…Today, much progress has been made in understanding the structure, properties, and growth of thin films of BiFeO 3 . High quality epitaxial BiFeO 3 films have been grown via molecular beam epitaxy [115,116], pulsed laser deposition [17,117], radio-frequency (RF) sputtering [118,119], metal-organic chemical vapor deposition (MOCVD) [120,121], and chemical solution deposition (CSD) [122] on a wide range of substrates including traditional oxide substrates as well as Si [117,123] and GaN [124]. This work has shown that high quality films, like those shown in Fig.…”