2014
DOI: 10.1088/1367-2630/16/11/113068
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Cryogenic surface ion trap based on intrinsic silicon

Abstract: Trapped ions are pre-eminent candidates for building quantum information processors and quantum simulators. To scale such systems to more than a few tens of ions it is important to tackle the observed high ion-heating rates and create scalable trap structures which can be simply and reliably produced. Here, we report on cryogenically operated intrinsic-silicon ion traps which can be rapidly and easily fabricated using standard semiconductor technologies. Single 40 Ca + ions have been trapped and used to charac… Show more

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Cited by 45 publications
(49 citation statements)
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“…When scaled by 1=d 4 to compare traps of different sizes, this heating rate is lower than that reported in any other trap fabricated on a silicon substrate. 8,9,11,12,14,24 Motional heating at this level would lead to an error of less than 10 À2 in a 100 ls two-ion-qubit gate, below the faulttolerance threshold for large scale quantum computing with surface-code error-correction schemes. 25 We have shown basic functionality for quantum processing using a fabrication process, without modification, that has enabled scaling to billions of transistors.…”
mentioning
confidence: 98%
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“…When scaled by 1=d 4 to compare traps of different sizes, this heating rate is lower than that reported in any other trap fabricated on a silicon substrate. 8,9,11,12,14,24 Motional heating at this level would lead to an error of less than 10 À2 in a 100 ls two-ion-qubit gate, below the faulttolerance threshold for large scale quantum computing with surface-code error-correction schemes. 25 We have shown basic functionality for quantum processing using a fabrication process, without modification, that has enabled scaling to billions of transistors.…”
mentioning
confidence: 98%
“…The traps are often built upon nonsilicon substrates, 6,7 and where silicon is used, only a few metal layers (four maximum) have been implemented. [8][9][10][11][12][13][14][15] None of the traps made on silicon substrates to date have had doped, active device fabrication available, and due to the idiosyncratic process steps used, the lithographic resolution is typically limited. Repeatability at different facilities is almost impossible due to local process variations and substrate processing capabilities.…”
mentioning
confidence: 99%
“…where S E (ω + ) is the spectral density of electric field [32][33][34][35][36][37][38], squares denote measurements in Penning traps on single ions [21] and ion crystals [39,40] conducted at room temperature. This work is plotted as a blue circle.…”
mentioning
confidence: 99%
“…As shown in figure 12(a), fault tolerance is not achieved above n K 2 25 = / quanta s −1 which corresponds to a motional mode heating rate during the gate (ṅ) of 100 and 200 quanta s −1 for K=2 and K=4, respectively. A heating rate (ṅ) of about 58 quanta s −1 has been observed for a single 9 Be + ion on a room temperature surface trap with a cleaned surface (40 μs above the trap surface, 3.6 MHz trap frequency) [126] and a silicon based trap in a cryogenic environment used to trap individual 40 Ca + ions exhibited heating rates as low as 0.33 quanta s −1 (0.6(2) quanta s −1 on average) (230 μs from the surface, 1.1 MHz trap frequency) [127]. For 171 Yb + ions located 70 μs above the trap surface with a trap frequency of 3 MHz, these heating rates correspond to expected heating rates of 0.5 quanta s −1 and 0.7 quanta s −1 assuming that the heating rate scales as ω −2.4 for fixed ion and d −4 for fixed ω [126,128].…”
Section: Single Error Source Dominant Effectsmentioning
confidence: 99%