1990
DOI: 10.1063/1.102812
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Critical thickness in epitaxial CdTe/ZnTe

Abstract: The critical thickness for coherent growth of CdTe on ZnTe by molecular beam epitaxy is assessed by reflection high-energy electron diffraction, low-temperature photoluminescence, and transmission electron microscopy. The value is found to be 5 monolayers for this high mismatch system (6%). As opposed to similar studies on III-V and Si-Ge systems, there is no evidence of island formation before relaxation by dislocations at the interface.

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Cited by 93 publications
(26 citation statements)
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“…As the growth proceeds (h increases), the initial 2D-coherent growth mode changes into the 2D-MD one when the layer thickness h exceeds a critical value h c MD of about 5 monolayers (MLs). This is confirmed by the observation in situ of a streaky RHEED pattern as previously reported for CdTe/ZnTe (see for example Cibert et al [8]). Note that this behavior contrasts with the one predicted [17] and observed [18] for InAs/GaAs (001): in this case the transition which occurs first is the elastic one with the formation of coherent islands at a critical thickness h c SK of about 1.7 ML.…”
supporting
confidence: 89%
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“…As the growth proceeds (h increases), the initial 2D-coherent growth mode changes into the 2D-MD one when the layer thickness h exceeds a critical value h c MD of about 5 monolayers (MLs). This is confirmed by the observation in situ of a streaky RHEED pattern as previously reported for CdTe/ZnTe (see for example Cibert et al [8]). Note that this behavior contrasts with the one predicted [17] and observed [18] for InAs/GaAs (001): in this case the transition which occurs first is the elastic one with the formation of coherent islands at a critical thickness h c SK of about 1.7 ML.…”
supporting
confidence: 89%
“…However, in the case of II-VI systems, which can exhibit mismatch as large as 6% for CdTe/ZnTe or CdSe/ZnSe, the 2D-3D transition is much less obvious: no clear 3D RHEED pattern has been reported during growth although zero-dimensional behavior was obtained [4][5][6][7]. In II-VIs indeed, above critical thickness, MD form easier than in III-Vs as clearly observed for CdTe/ZnTe by Cibert et al [8], which corresponds to a plastic relaxation as first considered by Frank and van der Merwe [2]. On the other hand, there are systems such as GaN/AlN [9] or SiGe/Si [10,11], with lower misfit (respectively 2.4% and less than 4%), which are known for exhibiting a clear SK transition with the formation of coherent islands.…”
mentioning
confidence: 61%
“…Lattice constants of free-standing wurtzite InAs and InP are a͑InAs͒ = 0.42 nm, c͑InAs͒ = 0.69 nm and a͑InP͒ = 0.40 nm, c͑InP͒ = 0.66 nm, respectively. Thickness of the InAs hexagonal tube, a few MLs, is less than the critical thickness for the onset of strain relaxation 11 and therefore the ultrathin InAs hexagonal tube is considered to be coherently strained in all directions and to be in nearly hydrostatic strain field. Model-solid theory by Van de Walle 12 explains that nearly hydrostatic strain field forms type-II band lineup.…”
mentioning
confidence: 99%
“…First, a thick ZnTe or Zn 0.7 Mg 0.3 Te buffer layer is grown at 360°C on a (001)-ZnTe substrate. Secondly, a highly strained two-dimensional CdTe layer is grown at 300°C at a thickness just below the onset of plastic relaxation: 4.2 and 7.2 ML on ZnTe [9] and on Zn 0.7 Mg 0.3 Te, respectively. At this stage of the growth the RHEED pattern is still streaky.…”
Section: Growth and Experimentsmentioning
confidence: 99%