Critical Dimension Measurement Using New Scanning Mode and Aligned Carbon Nanotube Scanning Probe Microscope Tip

Yasutake, Masatoshi; Watanabe, Kazutoshi; Wakiyama, Sigeru; Yamaoka, T.

doi:10.1143/jjap.45.1970

Cited by 17 publications

(18 citation statements)

References 7 publications

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“…And the measured 16 is an estimation of the cantilever tilt angle, which is designed to be 12 in the AFM used in the experiments. 15 Therefore, the dynamic convolution model is of special significance to precisely and quantitatively measure the sharp nanostructures and will be especially useful in CD measurements 16,17 and in the probe characterization. 7,18 For the critical dimension measurements in dynamic mode, the amplitude effect should be removed to get more accurate results.…”

Section: Resultsmentioning

confidence: 99%

Cantilever Tilt Causing Amplitude Related Convolution in Dynamic Mode Atomic Force Microscopy

et al. 2011

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Section: Resultsmentioning

confidence: 99%

Cantilever Tilt Causing Amplitude Related Convolution in Dynamic Mode Atomic Force Microscopy

et al. 2011

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“…After KPFM evaluation, C-AFM was carried out at a bias voltage of -2 V on the same areas in the composite electrodes. The Sampling Intelligent Scan (SIS) 30 mode was used for SSRM and C-AFM measurements. A boron-doped diamond-coated Si cantilever (SI-DF40-CD; Hitachi High-Tech Corp.) was used for these studies.…”

Section: Methodsmentioning

confidence: 99%

Visualizing Local Electrical Properties of Composite Electrodes in Sulfide All-Solid-State Batteries by Scanning Probe Microscopy

Otoyama

Yamaoka

Ito

et al. 2020

Preprint

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Studies on local conduction paths in composite electrodes are essential to the realization of high-performance sulfide all-solid-state lithium batteries. Here, we directly evaluate the electrical properties of individual LiNi1/3Mn1/3Co1/3O2 (NMC) electrode active material particles in composite positive electrodes by scanning probe microscopy (SPM) techniques. Kelvin probe force microscopy (KPFM) and scanning spreading resistance microscopy (SSRM) were combined. The results indicated that all NMC particles exhibit a charged state with increasing potential, but low electronic conduction paths exist at point contacts of some NMC particles. Furthermore, the I-V characteristics measured by conductive-atomic force microscopy (C-AFM) suggest that these specific NMC particles show low charge-discharge reactivity. The results of the SPM techniques indicate that poor conduction locally limits the charge-discharge reactivity of electrode active materials, leading to the degradation of battery performance. Such SPM combination accelerates the morphological optimization of composite electrodes by facilitating the investigation of the intrinsic electrical properties of the electrodes.

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“…The scan modes available are the following: Sampling Intelligent Scan (SIS) [7] for imaging, AFM for particle removal and Dynamic Mode Processing (DMP) for repairing. SIS and DMP modes are strictly related, both of them operate with the cantilever oscillating close to resonance frequency and the oscillation amplitude is controlled.…”

Section: Scan Mode and Scan Type Descriptionmentioning

confidence: 99%

A semi-automated AFM photomask repair process for manufacturing application using SPR6300

Dellagiovanna¹,

Yoshioka²,

Miyashita³

et al. 2007

SPIE Proceedings

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For almost a decade Nanomachining application has been studied and developed to repair next generation of photomasks. This technique, based on Atomic Force Microscopy (AFM), applies a mechanical removing of the defects with almost negligible quartz-damage, high accuracy of the edge-placement and without spurious depositions (stain, implanted elements, etc.) that may affect the optical transmission. SII NanoTechnology Inc. (SIINT) is carrying out a joint-development project with DNP Photomask Europe S.p.A. (DPE) that has allowed the installation in DPE of the next generation state-of-the-art AFM based system SPR6300 to meet the repair specifications for the 65 nm Node.Drift phenomena of the AFM probe represent one of the major obstacles for whichever kind of nano-manipulation (imaging and material or pattern modification). AFM drift undermines the repeatability and accuracy performances of the process. The repair methodology, called NewDLock, implemented on SPR6300, is a semi-automated procedure by which the drift amount, regardless of its origin, is estimated in advance and compensated during the process. Now AFM Nanomachining approach is going to reveal properties of repeatability and user-friendly utilization that make it suitable for the production environment.

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Critical Dimension Measurement Using New Scanning Mode and Aligned Carbon Nanotube Scanning Probe Microscope Tip

Cited by 17 publications

References 7 publications

Cantilever Tilt Causing Amplitude Related Convolution in Dynamic Mode Atomic Force Microscopy

Cantilever Tilt Causing Amplitude Related Convolution in Dynamic Mode Atomic Force Microscopy

Visualizing Local Electrical Properties of Composite Electrodes in Sulfide All-Solid-State Batteries by Scanning Probe Microscopy

A semi-automated AFM photomask repair process for manufacturing application using SPR6300

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