Creation of Controlled Defects Inside Colloidal Crystal Arrays with a Focused Ion Beam

Abstract

In this work the reliability of the focused-ion-beam (FIB) patterning on polystyrene (PS) colloidal crystals at different scales is determined. Ordered arrays of PS spheres (465 nm) are successfully modified by selectively removing a single sphere. The water-vapor assisted FIB milling is crucial to obtain this result. Furthermore, isolated PS spheres are FIB drilled with or without chemically enhanced milling aiming at the exploration of the limits of such a technique. These controlled defects created using the FIB-assisted techniques may be helpful in preparing mockups of photonic crystals, sensors or as colloidal masks for diverse lithographic processes.

Advanced Colloidal Lithography Beyond Surface Patterning

“…Isa and coworkers employed colloidal self‐assembly at liquid‐liquid interfaces to fabricate regular, open particle lithography masks, which can be employed to produce diverse biosensing structures . Magni and coworkers reported that ordered arrays of PS spheres (465 nm) are successfully modified by selectively removing a single sphere focused‐ion beam (FIB) patterning . Complex 3D nanostructures can be fabricated by harnessing the Talbot field distribution generated by a 2D nanosphere array.…”

Inhibited/enhanced fluorescence of embedded fluorescent defects by manipulation of spontaneous emission based on photonic stopband

“…Great efforts have been made in the controlled incorporation of articial defects inside the CCs. [13][14][15][16][17][18][19] Two-photon polymerization (TPP) is a versatile topdown method for the controlled insertion of designed defects into a CC with high resolution and precise position, in which the photochemical process is conned to a focal volume of the order of the cube of the excitation wavelength. 20 Rinne et al have created designed defects in an opal CC via TPP, and demonstrated the waveguiding properties aer silicon replication.…”