“…Local potential modulation can be introduced by various means including electrostatic or chemical gating which is achieved through chemical doping with adsorption of charged molecules as a dopant (Dong et al, 2009;Farmer et al, 2009;Kulkarni et al, 2016;Mulyana et al, 2016a), or high-resolution resist materials like hydrogen silsesquioxane (HSQ) (Brenner and Murali, 2010) and SU8 (Yun et al, 2014), as a complementary dopant, or by constructing double gates below and on top of the graphene layer through electrostatic modification of gate insulator (Chiu et al, 2010) or by focused laser irradiation (Kim et al, 2013;Seo et al,2014), or strain of graphene to induce electrostatic gating, (Sun et al,2016) and as there had been several examples in the STM community (i.e., Crommie group) (Velasco et al, 2018). A major challenge is to control charge carrier density at the true nanometer scale (Kong et al, 2014;Solı ´s-Ferna ´ndez et al, 2016).…”