Cr2O3 thin films grown at room temperature by low pressure laser chemical vapour deposition

Abstract

Chromia (Cr2O3) has been extensively explored for the purpose of developing widespread industrial applications, owing to the convergence of a variety of mechanical, physical and chemical properties in one single oxide material. Various methods have been used for large area synthesis of Cr2O3 films. However, for selective area growth and growth on thermally sensitive materials, laser-assisted chemical vapour deposition (LCVD) can be applied advantageously.Here we report on the growth of single layers of pure Cr2O3 onto sapphire substrates at room temperature by low pressure photolytic LCVD, using UV laser radiation and Cr(CO)(6) as chromium precursor. The feasibility of the LCVD technique to access selective area deposition of chromia thin films is demonstrated. Best results were obtained for a laser fluence of 120 mJ cm(-2) and a partial pressure ratio of O-2 to Cr(CO)(6) of 1.0. Samples grown with these experimental parameters are polycrystalline and their microstructure is characterised by a high density of particles whose size follows a lognormal distribution. Deposition rates of 0.1 nm s(-1) and mean particle sizes of 1.85 mu m were measured for these films. (C) 2011 Elsevier B.V. All rights reserved. Document Type: ArticleLanguage: English

CVD synthesis and catalytic combustion application of chromium oxide films

“…Cr 2 O 3 can be synthesized by many different techniques such as solution combustion [6], arc ion plating [7], pulsed laser deposition [8], plasma spraying [9], electrochemical deposition, magnetron sputtering, reactive sputtering [10][11][12], electron beam evaporation, spray pyrolysis, ion implantation and chemical vapor deposition (CVD) [13][14][15][16][17][18][19][20]. In recent years, a new method named pulsed-spray evaporation CVD (PSE-CVD) was used to synthesize pure transition metal oxides such as Co 3 O 4 and Mn 3 O 4 [21].…”

Toughness measurement and toughening mechanisms of arc ion plating Cr2O3 films treated by annealing

“…Thus, Cr 2 O 3 has been widely used in magnetic recording heads [3], bearings [4], and casing walls. Researchers deposited Cr 2 O 3 thin films using different techniques, such as plasma-spray [5], pulsed laser deposition [6], laser chemical vapor deposition [7], electrochemical deposition [8], direct current sputtering [9], reactive radio frequency magnetron sputtering [10], and arc ion plating (AIP) [11]. These studies mainly focused on the roles of deposition parameters and thermal treatment on the microstructure, mechanical properties, and tribological properties of Cr 2 O 3 films.…”

Electrophoretic Deposition of Aqueous Nano‐Cr2O3 Suspension

“…It has been reported that chromium (III) oxide (Cr 2 O 3 ) coating was widely used in various fields, such as wear resistance, corrosion protection, electronics, and optics due to its very desirable properties such as mechanical strength, high hardness, chemical inertness, optical characteristics, and low friction coefficient …”

“…It has been reported that chromium (III) oxide (Cr 2 O 3 ) coating was widely used in various fields, such as wear resistance, corrosion protection, electronics, and optics due to its very desirable properties such as mechanical strength, high hardness, chemical inertness, optical characteristics, and low friction coefficient. [1][2][3][4][5][6][7][8][9][10] In previous work, we have shown that Cr 2 O 3 coating could be easily electrophoretic deposited from suspension of acetylacetone and ethanol, and the electrophoretic Cr 2 O 3 coating could become uniform and dense after sintering treatment. 11 However, an aqueous electrophoretic deposition (EPD) has the advantages of lower deposition voltage, lower cost, and more attractively, a lower environmental protection cost.…”