1998
DOI: 10.1016/s0009-2614(98)00128-6
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Covalent bonding of thiophenes to Si(111) by a halogenation/thienylation route1Issued as NRCC Publ. No. 40854.1

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Cited by 65 publications
(97 citation statements)
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“…Figure 1 shows the O 1s, N 1s, C 1s, and S 2s spectra of cysteine films as a function of exposure time, with their corresponding peak positions and assignments of the fitted features given in Tables S1 and S2 (Supporting Information). It should be noted that because the S 2p spectrum partially overlaps with one of the plasmon peaks of Si located at ∼168.0 eV (Supporting Information, Figure S2), 25 we have chosen S 2s for the present work. At very low exposures of 5−15 s, the N 1s spectra (Figure 1b) show only one peak at 398.7 ± 0.1 eV, attributed to a N−Si bond, which indicates that cysteine undergoes N−H dissociative adsorption on Si(111)7×7.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…Figure 1 shows the O 1s, N 1s, C 1s, and S 2s spectra of cysteine films as a function of exposure time, with their corresponding peak positions and assignments of the fitted features given in Tables S1 and S2 (Supporting Information). It should be noted that because the S 2p spectrum partially overlaps with one of the plasmon peaks of Si located at ∼168.0 eV (Supporting Information, Figure S2), 25 we have chosen S 2s for the present work. At very low exposures of 5−15 s, the N 1s spectra (Figure 1b) show only one peak at 398.7 ± 0.1 eV, attributed to a N−Si bond, which indicates that cysteine undergoes N−H dissociative adsorption on Si(111)7×7.…”
Section: ■ Results and Discussionmentioning
confidence: 99%
“…8,9 We have used a similar approach to covalently attach thiophenes to the Si(111) surface. 10 In this case, surfaces were brominated by reaction with N-bromosuccinimide or bromotrichloromethane using radical initiating conditions followed by reaction with 2-thienyllithium or the bi-and terthiophene analogues. While it may be too early to generalize, it appears that the surface chemistry of Si(111)-H closely parallels molecular organosilane chemistry.…”
Section: Introductionmentioning
confidence: 99%
“…[14,15] Another commonly used method for chlorination in the liquid phase involves heating the SiÀH surfaces with PCl 5 at about 80 ± 100 8C in the presence of benzoyl peroxide as the radical initiator. [12] Herein, we report on a very simple and novel method for the functionalization of H-terminated porous and crystalline silicon surfaces with alcohols in a solution phase, using CHI 3 as the in situ iodinating agent. [12] Herein, we report on a very simple and novel method for the functionalization of H-terminated porous and crystalline silicon surfaces with alcohols in a solution phase, using CHI 3 as the in situ iodinating agent.…”
Section: Surface Functionalization Of H-terminated Silicon Surfaces Wmentioning
confidence: 99%
“…and I . [12] The chemical selectivity of atomic iodine over atomic chlorine has been observed during the gas ± solid reaction of ICl with a Si(111) ± (7 Â 7) surface, and it was proposed that the selectivity was due to the higher polarizability of I . [18] The CHI 2 .…”
Section: Surface Functionalization Of H-terminated Silicon Surfaces Wmentioning
confidence: 99%