2007
DOI: 10.1016/j.aeue.2006.12.007
|View full text |Cite
|
Sign up to set email alerts
|

Coupling tolerances of high-index silicon-oxynitride waveguides with small bending radii

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2009
2009
2021
2021

Publication Types

Select...
2
2

Relationship

0
4

Authors

Journals

citations
Cited by 4 publications
(1 citation statement)
references
References 3 publications
0
1
0
Order By: Relevance
“…Fadel et al. [ 67 ] studied the impact of non‐zero end separation in the coupling of UHNA‐3 fibers to waveguides, finding an end‐separation of 1 µm leads to a 0.4 dB coupling loss per facet. A 1 µm separation can result from a cleave angle error from perpendicular in the wafer plane of less than 1 degree for a 125 µm cladding diameter, this level of tolerance being rather difficult to achieve with hand cleaving and wafer alignment in the lithography tools.…”
Section: Characterization Of the Hybrid As2s3–ge:sio2 Waveguidementioning
confidence: 99%
“…Fadel et al. [ 67 ] studied the impact of non‐zero end separation in the coupling of UHNA‐3 fibers to waveguides, finding an end‐separation of 1 µm leads to a 0.4 dB coupling loss per facet. A 1 µm separation can result from a cleave angle error from perpendicular in the wafer plane of less than 1 degree for a 125 µm cladding diameter, this level of tolerance being rather difficult to achieve with hand cleaving and wafer alignment in the lithography tools.…”
Section: Characterization Of the Hybrid As2s3–ge:sio2 Waveguidementioning
confidence: 99%