2006
DOI: 10.1063/1.2402779
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Coupling of Helium and Impurities to the H/D Background in Magnetically Confined Plasmas

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Cited by 3 publications
(4 citation statements)
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“…For higher n, we used a Genetic Algorithm (GA) [9] to generate a spin-dependent Q isol (n) scaling laws for all kinds of transitions. The calculated total DR rate coefficients [10] agree well (within 20%) with the detailed calculations of Burgess and Tworkowski [11] and Wang et al [12] while deviations by more than a factor of 2 are visible for other methods [10] for the considered electron temperature range 5-5000 eV.…”
Section: Dense Plasma Effects On Helium Dr Ratessupporting
confidence: 60%
“…For higher n, we used a Genetic Algorithm (GA) [9] to generate a spin-dependent Q isol (n) scaling laws for all kinds of transitions. The calculated total DR rate coefficients [10] agree well (within 20%) with the detailed calculations of Burgess and Tworkowski [11] and Wang et al [12] while deviations by more than a factor of 2 are visible for other methods [10] for the considered electron temperature range 5-5000 eV.…”
Section: Dense Plasma Effects On Helium Dr Ratessupporting
confidence: 60%
“…C, Ar and W impurities typical in tokamak and stellarator plasmas were chosen for 2D transport modelling. The atomic data of C and Ar were taken to be the same as in [29][30][31] using the ADAS database [53]. Charge-exchange rates were calculated according to the formula from [54].…”
Section: Modelling Of Impurity Cs Transportmentioning
confidence: 99%
“…Ionization/recombination processes began to be considered not as sources and sinks of standard equations, but on equal terms with particle transport, i.e. as a kind of transport phenomenon in the CS phase space [27][28][29][30]. This was initially as impurity CS diffusion [27,28] and later within the framework of traditional transport analysis via D and V [29,30], as a one-dimensional (1D) Markovian stochastic process and/or as impurity CS kinetics [31] and, finally, as impurity CS transport in plasmas [32,33].…”
Section: Introductionmentioning
confidence: 99%
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