2023
DOI: 10.1016/j.talanta.2022.123826
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Counting DNA molecules on a microchannel surface for quantitative analysis

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Cited by 5 publications
(5 citation statements)
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“…The semiconductive properties of silicon wafers effectively mitigate charging effects, [ 19 ] and the silicon oxide layer can be derivatized using quaternary ammonium siloxane to immobilize the DNA backbone. [ 10 ] To explore the influence of surface attributes, we applied a droplet of PVP solution to four different surfaces. After drying, the edges of the droplets were captured using SEM.…”
Section: Resultsmentioning
confidence: 99%
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“…The semiconductive properties of silicon wafers effectively mitigate charging effects, [ 19 ] and the silicon oxide layer can be derivatized using quaternary ammonium siloxane to immobilize the DNA backbone. [ 10 ] To explore the influence of surface attributes, we applied a droplet of PVP solution to four different surfaces. After drying, the edges of the droplets were captured using SEM.…”
Section: Resultsmentioning
confidence: 99%
“…Preparation of Positively Charged Silicon Wafer Surface: Silicon wafers with a 30-nm SiO 2 layer were purchased from Wafer Market (Yong-In, Korea). The method established for glass coverslips [10] was adapted to treat the SiO 2 layer and create positively charged surfaces. The wafers were incubated in a 250-mL solution containing N-trimethoxysilylpropyl-N, N, Ntrimethylammonium chloride (1.1 mm) at 65 °C with agitation at 100 rpm for 16 h. They were then rinsed three times with 99.9% ethanol and stored in 99.9% ethanol.…”
Section: Dna-binding Protein (Mneongreen-hmg)mentioning
confidence: 99%
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“…PDMS devices and positively charged surfaces were prepared as previously described . In particular, microchannel templates had two layers on a silicon wafer.…”
Section: Methodsmentioning
confidence: 99%
“…PDMS devices and positively charged surfaces were prepared as previously described. 42 In particular, microchannel templates had two layers on a silicon wafer. First, the SU-82015 photoresist was spin-coated to form a 20 μm photoresist layer with subsequent exposure to 350 nm radiation in a mask aligner (Midas System MDA-400LJ, Daejeon, Korea).…”
Section: ■ Introductionmentioning
confidence: 99%