Coulomb interactions in particle beams

Jansen, G. H.

doi:10.1116/1.584148

Cited by 77 publications

(49 citation statements)

References 15 publications

(27 reference statements)

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“…The coefficient of thermal expansion ␣ f and the biaxial modulus E f /(1Ϫ f ) can be determined simultaneously, since the temperature dependence on the stress, for the same film deposited on two different substrates is known. They can be readily obtained by solving two equations 5,15,16,19,20 of the form given in Eq. ͑2͒, or by plotting two E f /(1Ϫ f ) vs ␣ f curves to find their intersection.…”

Section: B Coefficient Of Thermal Expansion and Biaxial Modulus Measmentioning

confidence: 99%

“…For example, using nanoindentation and Brillouin scattering, Jiang et al determined E and separately for a-C:H ͑Ref. 8͒ and a-Si:H. 9 The CTEs of a-Si:H, 15 16 Al, 21 and Cr, 22 have been obtained using a technique, thermally induced bending ͑TIB͒, based on the determination of the curvature of the filmϩsubstrate composite as a function of temperature. Recently, x-ray diffraction 23 and dilatometry 24 have also been used to determine the thermal expansion coefficients of some metallic films.…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Coefficient of thermal expansion and elastic modulus of thin films

Lima

Lacerda

Vilcarromero

et al. 1999

Journal of Applied Physics

134

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The coefficient of thermal expansion ͑CTE͒, biaxial modulus, and stress of some amorphous semiconductors ͑a-Si:H, a-C:H, a-Ge:H, and a-GeC x :H͒ and metallic ͑Ag and Al͒ thin films were studied. The thermal expansion and the biaxial modulus were measured by the thermally induced bending technique. The stress of the metallic films, deposited by thermal evaporation ͑Ag and Al͒, is tensile, while that of the amorphous films deposited by sputtering ͑a-Si:H, a-Ge:H, and a-GeC x :H͒ and by glow discharge (a-C:H) is compressive. We observed that the coefficient of thermal expansion of the tetrahedral amorphous thin films prepared in this work, as well as that of the films reported in literature, depend on the network strain. The CTE of tensile films is smaller than that of their corresponding crystalline semiconductors, but it is higher for compressive films. On the other hand, we found out that the elastic biaxial modulus of the amorphous and metallic films is systematically smaller than that of their crystalline counterparts. This behavior stands for other films reported in the literature that were prepared by different techniques and deposition conditions. These differences were attributed to the reduction of the coordination number and to the presence of defects, such as voids and dangling bonds, in amorphous films. On the other hand, columnar structure and microcrystallinity account for the reduced elasticity of the metallic films.

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Section: B Coefficient Of Thermal Expansion and Biaxial Modulus Measmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Coefficient of thermal expansion and elastic modulus of thin films

Lima

Lacerda

Vilcarromero

et al. 1999

Journal of Applied Physics

134

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“…For neutral plasmas, the general agreement is that the Debye length should be used as a cutoff parameter. For non-neutral plasmas or charged-particle beams, Jansen indicates that it is more realistic to use the mean interparticle distance [16]. In the accelerator community a similar argument is often followed (see, for example, Le Duff [9] and Struckmeier [21]).…”

Section: Appendix Dmentioning

confidence: 99%

“…We have examined the derivation of the damping and diffusion coefficients in the Fokker-Planck formulation [16,17] in order to estimate dP͞dt for multiple collisions. The details depend on the particular distribution f͑x, y͒ used, but, apart from a numerical constant depending on the distribution, we find that Eq.…”

Section: Structure Of the Shell And Effect Of Multiple Collisionsmentioning

confidence: 99%

Coulomb scattering within a spherical beam bunch in a high current linear accelerator

Gluckstern

Fedotov

1999

Phys. Rev. ST Accel. Beams

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Beam halo formation issues are important for the design of high current linear ion accelerators. Various mechanisms can potentially cause beam halo. Some recent studies suggested that Coulomb collisions in the beam bunch can contribute significantly to beam bunch growth and halo development in linear accelerators. Despite the general belief that collisions are not important, it is clear that a rigorous treatment of this question is needed. In an effort to explore this issue in detail we have undertaken an analysis of the effects of Coulomb scattering between ions in a self-consistent spherical bunch.[S1098-4402(99)

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“…The energy resolution for most measurements was 0.7 eV fwhm (full width at half maximum). The structured regions at the onset of inner shell excitation were recorded at higher resolution ($0.55 eV fwhm) by reducing the gun current to $4 lA, to reduce resolution degradation associated with the Boersch (space charge) effect [26]. The gas phase spectra of most materials were obtained by placing $0.1 g in a metal tube directly attached to the collision cell.…”

Section: Gas Phase Measurements By Iseelsmentioning

confidence: 99%

Inner-shell excitation spectroscopy of peroxides

et al. 2015

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a b s t r a c t O 1s inner-shell excitation spectra of a number of vapor phase molecules containing peroxide bonds -hydrogen peroxide (H 2 O 2 ), di-t-butylperoxide ( t BuO t Bu), benzoyl peroxide, ((C 6 H 5 (CO)O) 2 ), luperox-F [1,3(4)-bis(tertbutylperoxyisopropyl) benzene], and analogous, non-peroxide compounds -water, t-butanol and benzoic acid have been measured. C 1s spectra are also reported. O 1s spectra of solid benzoic acid, di-t-butylperoxide and luperox-F recorded using a scanning transmission X-ray microscope, are also reported, and compared to the corresponding gaseous spectra. Spectral interpretation was aided by comparing the spectra of the peroxide and non-peroxide counterparts and with ab initio calculations. A characteristic O 1s ? r ⁄ O-O transition at 533.0(3) eV is identified in each peroxide species, which is absent in the corresponding non-peroxide counterpart species. The energy and intensity of the 533 eV peroxide feature is stable and thus useful for analysis of peroxides in mixtures, such as tracking residual peroxide initiators, or peroxides produced in fuel cells.

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Coulomb interactions in particle beams

Cited by 77 publications

References 15 publications

Coefficient of thermal expansion and elastic modulus of thin films

Coefficient of thermal expansion and elastic modulus of thin films

Coulomb scattering within a spherical beam bunch in a high current linear accelerator

Inner-shell excitation spectroscopy of peroxides

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