Cost of yield

Maynard, D.N.; Kerr, DV; Whiteside, C.

doi:10.1109/asmc.2003.1194488

Cited by 6 publications

(2 citation statements)

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“…Jacobs stated that by reducing bottleneck process stagnation contributes greatly to the reduction of cycle time [28]. Both Dietrich and Maynard further this concept by stating the solution of a bottleneck is not simply tool redundancy, but rather lie in tool and facility understanding [14], [38]. These metrics are based on a deep understanding of HVSF facilities and simply do not translate well to the realities of MT-HMLV facilities.…”

Section: Hvsf Global Metricsmentioning

confidence: 93%

Towards a metric management approach for multi-emerging technology based fabrication facilities

Tierney

Walsh

2009

PICMET '09 - 2009 Portland International Conference on Management of Engineering &Amp; Technology

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Multi Technology, High Product Mix, Low Volume fabrication facilities (MT-HMLV) are the harbingers of next generation economies. Yet MT-HMLV's are fraught with ineffective operation and strategic management practice. Practices they often borrow from the metric management approach endemic of single technology high volume production facilities. If this is true in a time of recession and increased globalization then these facilities are at risk.We focus on one very important group of these facilities; those which are working at the interface of micro technology, nanotechnology and semiconductor micro fabrication. This group is not atypical. Due to the high degree of success that the metrics management approach has enjoyed in High Volume Semiconductor Fabrication facilities (HVSF) they are the "Defacto" standard for any fabrication facility remotely akin to semiconductor fabrication and this group is. However, simply applying HVSF based metrics to our group of MT-HMLV facilities are proving ineffectual. We employ an extensive literature review and the case study methods to ascertain why these commonly used metrics have been so ineffectual. Further, we utilize these same techniques to develop a more useful metrics management approach for our specific group of MT-HMLV's facilities. We base our metrics on the unique nature of MT-HMLV facilities as well as traditionally used HVSF metrics and R&D metrics.

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Section: Hvsf Global Metricsmentioning

confidence: 93%

Towards a metric management approach for multi-emerging technology based fabrication facilities

Tierney

Walsh

2009

PICMET '09 - 2009 Portland International Conference on Management of Engineering &Amp; Technology

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“…A global metric centered on process speed is found in the process step named lithography ( Jacobs et al, 2001). Process step limitations to throughput is not overcome by simple process station redundancy but rather by understanding the scope of each processes or task required (Dietrich, 2004;Maynard et al, 2003) especially in highly flexible facilities. Yet most process time metrics other than lot moves have limited theoretical backing.…”

Section: High Volume Facilities Metricsmentioning

confidence: 99%

Managing highly flexible facilities: an essential complementary asset at risk

Tierney

Groen

Harms

et al. 2012

International Journal of Entrepreneurial Behavior &Amp; Research

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Purpose -Twenty first century problems are increasingly being addressed by multi technology solutions developed by regional entrepreneurial and intreprepreneurial innovators. However, they require an expensive new type of fabrication facility. Multiple technology production facilities (MTPF) have become the essential incubators for these innovations. This paper aims to focus on the issues. Design/methodology/approach -The authors address the lack of managerial understanding of how to express the value and operationally manage MTPF centers through the use of investigative case study methods for multiple firms in the study. Findings -Owing to the MTPF centers' novelty and outward similarity to high volume semiconductor fabrication (HVF) facilities, they are laden with ineffective operation and strategic management practices. Metrics are the standard for both operational and strategic management of HVF facilities, yet their application to this new type of center is proving ineffectual. Research limitations/implications -These new types of regional economic resources may be at risk. A new approach is needed. Practical implications -The authors develop an operational and strategic metrics management approach for MTPFs that are based on these facilities' unique nature and leverages both the HVF and R&D metrics knowledge base. Social implications -Innovations at the interface of micro technology, nanotechnology and semiconductor micro fabrication are poised to solve many of these problems and become a basis for job creation and prosperity. If a new management technique is not developed, then these harbingers of regional economic development will be closed. Originality/value -While there is an abundance of research on metrics for HVF, this is the first attempt to develop metrics for MTPFs.

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Product-mix decision in a mixed-yield wafer fabrication scenario

Chang

Chiou

2006

Int J Adv Manuf Technol

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Cost of yield

Cited by 6 publications

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Towards a metric management approach for multi-emerging technology based fabrication facilities

Towards a metric management approach for multi-emerging technology based fabrication facilities

Managing highly flexible facilities: an essential complementary asset at risk

Product-mix decision in a mixed-yield wafer fabrication scenario

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