This submission was created using the RSC Article Template (DO NOT DELETE THIS TEXT) (LINE INCLUDED FOR SPACING ONLY -DO NOT DELETE THIS TEXT)The atmospheric pressure chemical vapour deposition (APCVD) reaction of VCl 4 and VOCl 3 with cyclohexylphosphine at substrate temperatures of 600 C deposits thin films of amorphous vanadium phosphide. The films are black/gold, hard, chemically resistant and conductive. The APCVD reaction of MCl 5 (where M = Nb or Ta) with cyclohexylphosphine at 500 C -600 C deposits films of crystalline -MP and at 400 C -450 C amorphous films of stoichiometry MP are formed. The MP films are metallic, conductive, adherent and chemically resistant.