1981
DOI: 10.1016/0022-5088(81)90257-5
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Corrosion stability of vapour-deposited transition metal phosphides at high temperature

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1982
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Cited by 43 publications
(42 citation statements)
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“…the choice of substrate for the deposition process [5]. Lower temperature CVD reactions utilising both single-source [6] and dual-source approaches [7] from the reaction of TiCl 4 and PH 2 R (R = cyclohexyl or t-butyl) have been investigated.…”
mentioning
confidence: 99%
“…the choice of substrate for the deposition process [5]. Lower temperature CVD reactions utilising both single-source [6] and dual-source approaches [7] from the reaction of TiCl 4 and PH 2 R (R = cyclohexyl or t-butyl) have been investigated.…”
mentioning
confidence: 99%
“…10 It has also been shown that the reaction of a metal chloride with a primary organophosphine (RPH 2 ) provides a readily accesible low temperature route to metal phosphides [11][12][13][14] and recently this has been demonstrated for the production of -TaP from the reaction of TaCl 5 with Cy hex PH 2 . 15 We have shown that TiP films can be made from the APCVD reaction of TiCl 4 and Cy hex PH 2 . 12 Here we report the first APCVD study of group Vb phosphides from the reaction of volatile halide precursors and Cy hex PH 2 .…”
Section: Introductionmentioning
confidence: 99%
“…2 It has been used as a diffusion barrier layer in semiconductor devices. 3 Similarly, vanadium(III) phosphide (VP) is a hard, metallic conductor.…”
Section: Introductionmentioning
confidence: 99%
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“…of the phosphides have been done, although some phosphides have some good physical and chemical properties. For example, ZrP are such transition metal phosphides, which are of much interest in view of its high chemical and thermodynamic stability even at elevated temperatures [15][16][17][18][19][20][21]. ZrP shows relatively strong corrosion resistance of acid solutions, for example Hydrochloride.…”
Section: Introductionmentioning
confidence: 99%