2019
DOI: 10.1557/mrc.2018.239
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Corrosion-resistant nickel thin films by electroless deposition in foam of electrolyte

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Cited by 3 publications
(2 citation statements)
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“…The following electrolytes were selected for testing: acetic acid (AcOH) by Chempur (the method of depositing the coating based on VTMS and acetic acid was developed in previous studies [ 36 ]); lithium perchlorate (LiClO 4 ) by Fluka Chemika, as a strongly oxidizing anion of inhibiting properties [ 37 , 38 , 39 , 40 , 41 , 42 ]; sulphuric acid (VI) (H 2 SO 4 ) by Chempur; an acid medium, with a passive film forming on the metal surface, containing sparingly soluble thermodynamically stable oxidation products [ 43 , 44 , 45 , 46 ]; ammonia (NH 3 )- P.P.H. by Polskie Odczynniki Chemiczne; a basic medium, for controlling the hydrolysis and condensation rates [ 47 , 48 , 49 , 50 , 51 , 52 ]. …”
Section: Methodsmentioning
confidence: 99%
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“…The following electrolytes were selected for testing: acetic acid (AcOH) by Chempur (the method of depositing the coating based on VTMS and acetic acid was developed in previous studies [ 36 ]); lithium perchlorate (LiClO 4 ) by Fluka Chemika, as a strongly oxidizing anion of inhibiting properties [ 37 , 38 , 39 , 40 , 41 , 42 ]; sulphuric acid (VI) (H 2 SO 4 ) by Chempur; an acid medium, with a passive film forming on the metal surface, containing sparingly soluble thermodynamically stable oxidation products [ 43 , 44 , 45 , 46 ]; ammonia (NH 3 )- P.P.H. by Polskie Odczynniki Chemiczne; a basic medium, for controlling the hydrolysis and condensation rates [ 47 , 48 , 49 , 50 , 51 , 52 ]. …”
Section: Methodsmentioning
confidence: 99%
“…ammonia (NH 3 )- P.P.H. by Polskie Odczynniki Chemiczne; a basic medium, for controlling the hydrolysis and condensation rates [ 47 , 48 , 49 , 50 , 51 , 52 ].…”
Section: Methodsmentioning
confidence: 99%