2009
DOI: 10.1016/j.microrel.2009.07.046
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Corrosion-induced degradation of GaAs PHEMTs under operation in high humidity conditions

Abstract: The MIT Faculty has made this article openly available. Please share how this access benefits you. Your story matters. CitationHisaka, Takayuki et al. "Corrosion-induced degradation of GaAs PHEMTs under operation in high humidity conditions."

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Cited by 9 publications
(9 citation statements)
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“…Just prior to the deposition of the passivation film, a surface treatment that consists of dipping the wafer in a benzenoid-aromatic-compound-based organic solvent was performed. The treatment effectively reduces the amount of As-oxide at the semiconductor surface as reported previously [3]. treatment shows almost the same P out and G c as sample (a) without surface treatment.…”
Section: Methodssupporting
confidence: 79%
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“…Just prior to the deposition of the passivation film, a surface treatment that consists of dipping the wafer in a benzenoid-aromatic-compound-based organic solvent was performed. The treatment effectively reduces the amount of As-oxide at the semiconductor surface as reported previously [3]. treatment shows almost the same P out and G c as sample (a) without surface treatment.…”
Section: Methodssupporting
confidence: 79%
“…Double heterostructure AlGaAs/InGaAs PHEMTs [3] with around 0.2 µm gate length were fabricated for this study. The gate region was wet-chemically recessed to a desired drain current and metalized with Ti/Al for the gate electrode.…”
Section: Methodsmentioning
confidence: 99%
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“…The high gate-drain voltage stress used for large signal test is provided to evaluate hot electron effect [10][11][12]. The test of hydrogen effects which caused the degradation of maximum drain current and surface corrosion is introduced in [13][14][15].…”
Section: Introductionmentioning
confidence: 99%