Corrosion Behaviour of Ti-6Al-4V Alloy with Nitride Coatings in Simulated Body Fluids at <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" id="M1"><mml:mrow><mml:msup><mml:mrow><mml:mn mathvariant="bold">36</mml:mn></mml:mrow><mml:mo mathvariant="bold">∘</mml:mo></mml:msup><mml:mtext>C</mml:mtext></mml:mrow></mml:math> and <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" id="M2"><mml:mrow><mml:msup><mml:mrow><mml:mn mathvariant="bold">40</mml:mn></mml:mrow><mml:mo mathvariant="bold">∘</mml:m

Pohrelyuk, І. М.; Ткачук, О. В.; Proskurnyak, R. V.

doi:10.1155/2013/241830

Cited by 8 publications

(4 citation statements)

References 19 publications

(25 reference statements)

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“…Pohrelyuk et al (2013) demonstrated, for nitride Ti6Al4V alloys, that I corr ( μ A/cm 2 ) of both thin and thick films varied from 6 to 15, respectively, when 0.9 percent NaCl was used at 36°C. Recent studies have shown that grain size is a critical factor in the corrosion resistance of metallic materials and mechanical properties (Unal et al , 2014; Mao et al , 2011; Wang, Yu and Dong, 2006), where smaller grain size is associated with better corrosion resistance.…”

Section: Resultsmentioning

confidence: 97%

“…Most applications of titanium involve mixing it with small amounts of aluminum and vanadium, typically 6 and 4 percent, respectively, by weight, to form a metallic alloy, which is normally indicated as Ti6Al4V. The nitriding of this ternary titanium alloy (TiAlVN) enables enhanced mechanical properties, high resistance to corrosion and wear and good hardness and tenacity (Pohrelyuk et al , 2013). Few studies have been applied on this alloy as thin film; for instance, in previous work, we have demonstrated a successful preparation of TiAlV films by vacuum arc discharge technique starting from Ti, Al and V elemental targets (Abdallah, Mrad and Ismail, 2013).…”

Section: Introductionmentioning

confidence: 99%

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Deposition of TiN and TiAlVN thin films by DC magnetron sputtering

Abdallah

Kakhia

Alsadat

2019

IJSI

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Purpose TiN and TiAlVN films have been prepared by DC magnetron sputtering technique at room temperature. TiN target has been used to deposit TiN thin film under pure argon (100 percent Ar) gas. Additionally, Ti6Al4V alloy target has been used to deposit TiAlVN under nitrogen and argon gas (50 percent Ar and 50 percent N2). In this paper, two substrate types have been used: stainless steel 304 and Si(100). This analysis has confirmed that the nitride films, (TiN/Si) and TiAlVN in both cases, have been produced. Energy Depressive X-ray Spectroscopy (EDX) measurement confirmed that the TiN/Si was stoichiometry, where the N/Ti ratio was about 1 with low oxygen contamination. The results obtained have indicated that the TiAlVN has more resistance to corrosion than TiN film in 3.5 percent NaCl at 25°C (seawater). Both films, TiAlVN/SS304 and TiN/SS304, have shown improved corrosion resistance compared with virgin 304 substrate. Microhardness was carried out using Vickers method; the microhardness values for TiN/SS304 and TiAlVN/SS304 were approximately 7.5 GPa and 25.3 GPa, respectively. The paper aims to discuss these issues. Design/methodology/approach The films were prepared by a DC magnetron sputtering system starting from high pure (99.99 percent) Ti6Al4V target (Al 6wt%, V 4wt% and balance Ti) in plasma discharge argon/nitrogen (50 percent Ar and 50 percent N2) for deposition of TiAlVN film. Pure TiN target (99.99 percent) was used for preparation of TiN film in pure argon plasma. The diameter of target was 50 mm and the power applied for preparation of the two films was 100 W. A cylindrical high-vacuum chamber (Figure 2) made of stainless steel 316, with height 363 mm diameter, was fabricated locally. Scanning electron microscope images have been used to discover the films morphology. The composition of the films has been determined by EDX technique for films deposited on Si substrate. The electrochemical corrosion test was carried out using conventional three-electrode cell of 300 ml capacity by using Voltalab PGZ 301 system (France) using Tafel extrapolation method and electrochemical impedance spectroscopy techniques. Findings TiN and TiAlVN films have been prepared by DC magnetron sputtering technique without heating of the substrates holder. The effects of the composition of nitride films on mechanical and corrosion properties were investigated. The composition of the films has been determined by EDX technique. The effect of using titanium alloy (Ti with Al and V) on the composition and crystalline quality has been investigated. The microhardness is strongly dependent on the addition of the Al and V elements, and it consequently improves mechanical proprieties. The microhardness values for TiN/SS304 were approximately 7.5 GPa and 25.3 GPa for TiAlVN/SS304. They indicate that prepared films prevent the aggressive action of corrosion media. Originality/value TiN and TiAlVN films have been prepared by DC magnetron sputtering method at room temperature. Titanium nitride film, especially TiAlVN, is an effective method to improve the corrosion resistance of SS304. TiAlVN film has exhibited enhanced corrosion resistance and higher microhardness. Independent time-of-flight elastic recoil detection analysis has been used to determine the composition of the film.

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Section: Resultsmentioning

confidence: 97%

Section: Introductionmentioning

confidence: 99%

Deposition of TiN and TiAlVN thin films by DC magnetron sputtering

Abdallah

Kakhia

Alsadat

2019

IJSI

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“…Os efeitos da temperatura, tempo e atmosfera do gás sobre a nitretação por plasma da liga Ti-6Al-4V são complexos. O nitrogênio puro, uma mistura de nitrogênio e hidrogênio, uma mistura de nitrogênio e argônio e uma mistura de todos os três gases em várias proporções têm sido utilizados como atmosfera para a nitretação por plasma (RAAIF et al, 2007;RAHMAN et al, 2007;LIMA, 2010;HOSSEINI;AHMADI, 2013;POHRELYUK;TKACHUK;PROSKURNYAK, 2013;TANG et al, 2013). As funções da adição do hidrogênio no plasma é a de capturar os átomos de oxigênio presentes na atmosfera reduzindo as impurezas (MICHEL; CZERWIEC; GANTOIS, 1995) e também porque a presença do hidrogênio diminui a energia necessária para a produção de átomos de nitrogênio via dissociação molecular por colisão, já que os íons de H + , que têm menor massa e maior energia cinética do que os íons N + nas mesmas condições de pressão, tensão e temperatura, podem se dissociar em moléculas N 2 e espécies de NH x através da colisão em energias mais baixas para produzir átomos de nitrogênio ativos (BINGZHONG; YINGZHI, 1987).…”

Section: Parâmetros Do Processo De Nitretaçãounclassified

“…A liga de Ti-6Al-4V nitretada por plasma apresenta maior dureza superficial e tensão residual compressiva mais elevada em comparação com o material não nitretado, o que segundo vários autores (FU et al, 1998;GOLDEN et al, 2007 2004).…”

Section: Nitreto De Titâniounclassified

Estudo do comportamento mecânico em temperaturas elevadas da liga Ti-6Al-4V após tratamento superficial de nitretação por plasma

Almeida¹

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The Ti-6Al-4V alloy is one of the most widely used titanium alloys, but its structural applications at elevated temperatures are limited because of the titanium high affinity for oxygen. A surface treatment that improves the oxidation resistance of this alloy allowing the replacement of parts that are currently produced with Nibased super alloys by this material could significantly reduce the weight of these components. The aim of this work is to improve the creep resistance of the Ti-6Al-4V alloy using plasma nitriding. In order to homogenize the material microstructure, it was performed a heat treatment at 1050ºC for 30 minutes to obtain the Widmanstätten microstructure, which was the that presented better resistance to creep in the no nitrided material. The nitriding was performed by varying parameters as time, temperature and gas mixture in the atmosphere during the process. The chosen condition was a gas mixture of Ar: N 2 : H 2 (0.49: 0.49: 0.03) at 700°C for 4 hours. The compound layer characterization was performed by optical and scanning electron microscopy techniques and X-ray diffraction. The nitrided samples phases detected by XRD were -Ti 2 N, -TiN and the α-Ti and β-Ti matrix phases. The layer thickness of this sample was about 1 µm. The hot tensile tests were performed in a temperature range from 500°C to 700°C in nitrided and no nitrided materials and show an increase in the strength of the nitrided alloy up 29% in yield and ultimate strength. The creep tests were also performed in a temperature between 500 and 700ºC and stress range from 125 to 319 MPa. The results showed an increase in nitrided sample creep resistance. This was evidenced by both the decrease in secondary creep rate and an increase in final creep time.

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