2011
DOI: 10.1016/j.apsusc.2010.11.162
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Corrosion behaviour of sintered NdFeB coated with Al/Al2O3 multilayers by magnetron sputtering

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Cited by 49 publications
(20 citation statements)
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“…The vacancies and defects in the aluminide layers may be masked by the Al 2 O 3 , preventing the micropores from penetrating. 25 In addition, Al 2 O 3 particles promote passivating film to form on the top of iron aluminide. The passivating film can keep the active metals away from the electrolyte and improve the corrosion resistance of the composite coatings.…”
Section: Corrosion Resistancementioning
confidence: 99%
“…The vacancies and defects in the aluminide layers may be masked by the Al 2 O 3 , preventing the micropores from penetrating. 25 In addition, Al 2 O 3 particles promote passivating film to form on the top of iron aluminide. The passivating film can keep the active metals away from the electrolyte and improve the corrosion resistance of the composite coatings.…”
Section: Corrosion Resistancementioning
confidence: 99%
“…As an environment friendly technique, PVD including evaporation [16], ion vapour deposition (IVD) [17], and magnetron sputtering have been applied in industry [18,19]. Al coatings prepared by PVD are suitable for corrosion protection [20,21] and do not change the magnetic properties of the magnet [22,23]. However, the coating prepared by evaporation always exhibit defects in the form of micropores, whereas the coating prepared through IVD tend to exhibit large granulated inclusions and columnar structures, which could lead to perpendicular gaps [24].…”
Section: Introductionmentioning
confidence: 99%
“…Most of these methods (except the polyol method) use an oxygen‐free atmosphere to synthesize NS films to minimize the concern of oxidation of these materials. Particularly, MS technique is broadly used as the convenient method for the fast, eco‐friendly, and easy deposition of the thin films with superior adhesion . However, the frequently reported techniques for the synthesis of NS noble metal films are mainly chemical based and utilize the bottom‐up (where atomic level precursors are utilized to synthesize nanostructured materials) approach involving multi‐step process .…”
Section: Introductionmentioning
confidence: 99%