Corrigendum to Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputtering [Vacuum 152 (2018) 252–260]

Correia, Filipe C.; Salvador, Paulo B.; Ribeiro, Joana M.; Mendes, Ana Márcia Chiaradia; Tavares, C. J.

doi:10.1016/j.vacuum.2018.05.037

Vacuum

2018

DOI: 10.1016/j.vacuum.2018.05.037

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Corrigendum to Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputtering [Vacuum 152 (2018) 252–260]

Filipe C. Correia

Paulo B. Salvador

Joana M. Ribeiro

et al.

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Corrigendum to Effect on the electrical and morphological properties of Bi incorporation into ZnO:Ga and ZnO:Al thin films deposited by confocal magnetron sputtering [Vacuum 152 (2018) 252–260]

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