2023
DOI: 10.1063/5.0138952
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Correlative microscopy and monitoring of segregation processes in optoelectronic semiconductor materials and devices

Abstract: The present work comprises a practical tutorial on the topic of correlative microscopy and its application to optoelectronic semiconductor materials and devices. For the assessment of microscopic structure–property relationships, correlative electron microscopy, combined also with scanning-probe and light microscopy, exhibits a collection of indispensable tools to analyze various material and device properties. This Tutorial describes not only the various microscopy methods but also the specimen preparation in… Show more

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Cited by 4 publications
(2 citation statements)
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“…Slight morphological changes are visible. A multivariate algorithm , was used to identify and map the structural information from the local atomic structure. Several diffraction patterns were acquired during the time series (Figure b); all of these patterns were assigned successfully to the CsPb­(Br 0.8 I 0.2 ) 3 phase by determining the interplanar distances from the reflection positions.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Slight morphological changes are visible. A multivariate algorithm , was used to identify and map the structural information from the local atomic structure. Several diffraction patterns were acquired during the time series (Figure b); all of these patterns were assigned successfully to the CsPb­(Br 0.8 I 0.2 ) 3 phase by determining the interplanar distances from the reflection positions.…”
Section: Resultsmentioning
confidence: 99%
“…ICA is a special case of a blind source separation and is widely used in digital image processing. For more details on this approach, the reader is referred to refs ( 50 ) and ( 55 ).…”
Section: Experimental Methodsmentioning
confidence: 99%