The dislocation structure and photoluminescence of partially relaxed Si 1−x Ge x layers on Si(001) substrates were studied to reveal the contribution from dislocations localized in different regions of the heterostructure (SiGe layer, SiGe/Si interface, Si substrate) to the dislocation-related PL. The D1 and D2 lines were ascribed to products of dislocation reactions in intersection sites. The known dependence of the D4 line spectral position on the Ge content is not observed, which is explained by the effect of elastic strain in the SiGe/Si heterostructure.