Correlation of surface potential and SERS-activity of Ag particles formed by electroless deposition on Si-based substrate

Integrating the amino-functionalized MOF-5 film with the silver nanoparticle substrate for a high SERS enhancement effect and long-term stability

“…By reacting with APTES solution, these hydroxy-functionalized glass slides were embellished with amine groups to produce an Ag NP membrane as the initial platform and then through the Ag NP surface to quickly react with the amine groups on MOF-5-NH 2 to build a double-layer on the substrate. Four diffraction peaks at 2 of 38.21, 44.31, 64.41, and 77.81 were in accordance with the (111), ( 200), (220), and (311) crystalline planes of silver, 42,43 respectively, in the XRD patterns of the silver film (Fig. 1b).…”

Noble metal-free SERS: mechanisms and applications

“…Additionally, TMNs can exhibit plasmonic behavior in the visible and near-infrared range under certain conditions, such as variations in optical properties, chemical deposition, and structural size. 23,[96][97][98] For example, Sucheewa et al demonstrated that a hafnium nitride (HfN) thin film created through gas-timed RF magnetron sputtering exhibited an EF of 8.5 × 10 4 for MB molecules, which was largely attributed to an increased "hot spot" effect. The absorbance of the HfN thin film in the longer wavelength range (approximately 500-900 nm) is advantageous for surface plasmon resonance, which greatly enhances the electromagnetic mechanism on the surface.…”

“…97 Most importantly, HfN can provide a thermal effect; thus, a stable SERS signal of the analyte can be obtained. 98…”

Improvement of Heat Dissipation in Ag/Ni Substrates for Testing Cu-TiO2/TiO2-Modified Filters Using SERS Spectroscopy

“…Single-crystal silicon wafers doped with boron with an orientation of 100 and a resistance of 12 Ohm•cm ("Kamerton" branch of JSC "Integral", Pinsk, Belarus) were used as basic materials for the SERS-active substrate. Firstly, macroporous silicon (macroPSi) with pores of 1.0 ± 0.5 µm depth and diameter was formed by electrochemically anodizing the silicon sample at a current density of 8 mA/cm 2 for 210 s [26]. A solution of hydrofluoric acid (48%) and dimethyl sulfoxide mixed at a volume ratio of 10:46 was used to form macropores.…”