Correlation of silica glass properties with the infrared spectra

Agarwal, Anand; Tomozawa, M.

doi:10.1016/s0022-3093(96)00542-x

Cited by 162 publications

(132 citation statements)

References 40 publications

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“…The stress is also responsible for bond angle variations in the SiO 2 matrix that explain a faster etching rate in the LAZ. The correlation between stress and etching rate was shown in [24]. This supports the similar trend we are observing between the cantilever bending and the etching rate.…”

Section: Discussion and Interpretationsupporting

confidence: 87%

Direct volume variation measurements in fused silica specimens exposed to femtosecond laser

Champion¹,

Bellouard²

2012

Opt. Mater. Express

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Abstract:We introduce a new method to investigate localized volume variations resulting from laser exposure. Our method is based on the measurement of fused silica cantilevers deflection from which we calculate the effective stress and density variation in laser-affected zones. Specifically, we investigate density variations in fused silica exposed to femtosecond laser exposure in the regime where nanogratings are found. We demonstrate that a volume expansion is taking place in that particular regime. ©2012 Optical Society of America

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Section: Discussion and Interpretationsupporting

confidence: 87%

Direct volume variation measurements in fused silica specimens exposed to femtosecond laser

Champion¹,

Bellouard²

2012

Opt. Mater. Express

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“…Indeed, the stress not only influences optical properties (by introducing undesired birefringence effects) but also etching rates [10] as well as the formation of undesired cracks during the writing of arbitrary patterns. Therefore, an accurate knowledge of the stress-state induced in the material after laser exposure is essential for the reliability and repeatability of the direct-write process.…”

Section: Resultsmentioning

confidence: 99%

“…Stress not only influences optical properties but also etching rate [10] and the occurrence of cracks during laser exposure. In that context, the results presented here are of particular significance for assessing the stress distribution induced by femtosecond laser processing in the non ablative regime.…”

Section: Introductionmentioning

confidence: 99%

Stress distribution around femtosecond laser affected zones: effect of nanogratings orientation

Champion¹,

Beresna²,

Kazansky³

et al. 2013

Opt. Express

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Under certain exposure conditions, femtosecond lasers create nanogratings in the bulk of fused silica for which the orientation is governed by the laser polarization. Such nanostructure induces stress that affects optical and chemical properties of the material. Here, we present a method based on optical retardance measurement to quantify the stress around laser affected zones. Further, we demonstrate stress dependence on the nanogratings orientation and we show that the stress within single nanogratings lamellae can locally be as high as several gigapascals.

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“…As the number of pulses impacting the material increases, the material is progressively further densified and, as a consequence, the stress around the laser affected zones builds up. On the other hand, tensile stress also changes the bond angles between the tetrahedral constituents of the SiO 2 matrix [22] [25], which in turn has been correlated to an increase of the HF etching rate of SiO 2 [23]. The higher the tensile stress, the higher the etching rate.…”

Section: Interpretation and Hypothesesmentioning

confidence: 99%

Towards fast femtosecond laser micromachining of fused silica: The effect of deposited energy

Rajesh

Bellouard

2010

Opt. Express

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Femtosecond laser micromachining of glass material using lowenergy, sub-ablation threshold pulses find numerous applications in the fields of integrated optics, lab-on-a-chips and microsystems in general. In this paper, we study the influence of the laser-deposited energy on the performance of the micromachining process. In particular, we show that the energy deposited in the substrate affects its etching rate. Furthermore, we demonstrate the existence of an optimal energy deposition value. These results are not only important from an industrial point-of-view but also provide new evidences supporting the essential role of densification and consequently stress-generation as the main driving factor promoting enhanced etching rate following laser exposure. ©2010 Optical Society of America

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Correlation of silica glass properties with the infrared spectra

Cited by 162 publications

References 40 publications

Direct volume variation measurements in fused silica specimens exposed to femtosecond laser

Direct volume variation measurements in fused silica specimens exposed to femtosecond laser

Stress distribution around femtosecond laser affected zones: effect of nanogratings orientation

Towards fast femtosecond laser micromachining of fused silica: The effect of deposited energy

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