Correlation between microstructure and optical properties of nano-crystalline TiO2 thin films prepared by sol–gel dip coating

Thickness dependence of the growth of magnetron-sputtered TiO2 films studied by Raman and optical transmittance spectroscopy

“…Half width of the E g peak vs. crystallite size as deduced from XRD, including results from the literature. 4,18,27,28,35,36 thickness obtained from the simulation of the transmittance data are close to that obtained by profilometry (see Fig. 7).…”

“…Broadening due to laser induced heating is observed beyond 8 mW laser power with about 4% increase at 14 mW. Thus, the extra broadening in our films may be attributed to intrinsic defects in the films as in the report of Sahoo et al 8 Mechiakh et al 18 observed that the FWHM of the prominent E g 144 cm À1 peak decreases from 11 to 8 cm À1 upon annealing their dip coated anatase films at 600 and 800 C. This decrease appears due to the increase in the size of the crystallites from 27 to 43 nm determined using atomic force microscopy.…”

“…Singh and Kaur 17 observed that the optical band gap and refractive index of their sputtered anatase films decreases with increasing sputter power and pressure. Mathews et al 4 and Mechiakh et al 18 observed that the optical band gap of anatase decreases with annealing temperatures. Uniaxial strain in the films could also influence the optical properties.…”

Effect of ion bombardment on the structural and optical properties of TiO2 thin films deposited from oxygen/titanium tetraisopropoxide inductively coupled plasma

“…Up to now, various techniques have been applied to obtain these films, which can be classified under three families: Chemical Solution Deposition (also known as sol-gel process), Physical Vapour Deposition (PVD) and Chemical Vapour Deposition (CVD). Most of the films deposited by sol-gel techniques are based on hydrolysis of titanium alkoxides and require heating and calcination (at temperatures higher than 300 °C) to obtain anatase or rutile phases [4,[10][11][12]. In the case of PVD techniques, the film is obtained by vaporization upon thermal heating (evaporation) or ion bombardment (sputtering) of a solid Ti or TiO 2 target in the A C C E P T E D M A N U S C R I P T…”

Sol–gel derived nickel-doped TiO2films as wear protection coatings

“…Several methods have been employed to fabricate TiO 2 thin films, including e-beam evaporation [8], sputtering [9], chemical vapour deposition [10] and sol-gel process [11]. Due to several advantages such as low processing temperature, low equipment cost and good homogeneity, the sol-gel process is one of the most appropriate technologies to prepare thin films.…”