Correlation between electron and negative O− ion emission during reactive sputtering of oxides

Mahieu, Stijn; Depla, Diederik

doi:10.1063/1.2715113

Cited by 65 publications

(39 citation statements)

References 17 publications

(20 reference statements)

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“…The detrimental effect of such energetic oxygen ions on the electrical properties of ZnO was shown by Tominaga already two decades ago [10,33]. Recently, the energy distribution functions of negative oxygen ions were measured during reactive magnetron sputtering from different metal targets, proving the high energy of these ions convincingly [34,35]. The highest energies correspond to the difference between substrate and target potential, i.e.…”

Section: Resultsmentioning

confidence: 93%

Carrier transport in polycrystalline ITO and ZnO:Al II: The influence of grain barriers and boundaries

Ellmer

Mientus²

2008

Thin Solid Films

173

117

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Section: Resultsmentioning

confidence: 93%

Carrier transport in polycrystalline ITO and ZnO:Al II: The influence of grain barriers and boundaries

Ellmer

Mientus²

2008

Thin Solid Films

173

117

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“…The same is true for ions which are neutralized and reflected at the target, and for negative ions formed at the target [46]. Collisions will alter particle energy, direction, and momentum, and therefore also the morphology and microstructure of the growing film (see next section).…”

Section: Sputtered Particlesmentioning

confidence: 94%

Sputter Deposition Processes

Depla

Mahieu

Greene

2010

Handbook of Deposition Technologies for Films and Coatings

Self Cite

123

109

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Sputter deposition is a widely used technique to deposit thin films on substrates. The technique is based upon ion bombardment of a source material, the target. Ion bombardment results in a vapor due to a purely physical process, i.e. the sputtering of the target material. Hence, this technique is part of the class of physical vapor deposition techniques, which includes, for example, thermal evaporation and pulsed laser deposition. The most common approach for growing thin films by sputter deposition is the use of a magnetron source in which positive ions present in the plasma of a magnetically enhanced glow discharge bombard the target. This popular technique forms the focus of this chapter. The target can be powered in different ways, ranging from dc for conductive targets, to rf for nonconductive targets, to a variety of different ways of applying current and/or voltage pulses to the target. Since sputtering is a purely physical process, adding chemistry to, for example, deposit a compound layer must be done ad hoc through the addition of a reactive gas to the plasma, i.e. reactive sputtering. The undesirable reaction of the reactive gas with the target material results in a non-linear behavior of the deposition parameters as a function of the reactive gas flow. To model this behavior, the fluxes of the various species towards the target must be determined. However, equally important are the fluxes of species incident at the substrate because they not only influence the reactive sputter deposition process, but also control the growth of the desired film. Indeed, the microstructure of magnetron sputter deposited films is defined by the identity of the particles arriving at the substrate, their fluxes and the energy per particle.

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“…For example, thin-film growth of oxides often yields energetic negative oxygen ions [134,135,136,137,138,139,140,141,142,143].…”

Section: 31)mentioning

confidence: 99%

The M+1AX phases: Materials science and thin-film processing

et al. 2010

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This article is a critical review of the M n+1 AX n phases ("MAX phases", where n =1, 2, or 3) from a materials science perspective. MAX phases are a class of hexagonal-structure ternary carbides and nitrides ("X") of a transition metal ("M") and an A-group element. The most well known are Ti 2 AlC, Ti 3 SiC 2 , and Ti 4 AlN 3 . There are ~60 MAX phases with at least 9 discovered in the last five years alone. What makes the MAX phases fascinating and potentially useful is their remarkable combination of chemical, physical, electrical, and mechanical properties, which in many ways combine the characteristics of metals and ceramics. For example, MAX phases are typically resistant to oxidation and corrosion, elastically stiff, but at the same time they exhibit high thermal and electrical conductivities and are machinable. These properties stem from an inherently nanolaminated crystal structure, with M n+1 X n slabs intercalated with pure A-element layers. The research on MAX phases has been accelerated by the introduction of thin-film processing methods.Magnetron sputtering and arc deposition have been employed to synthesize single-crystal material by epitaxial growth, which enables studies of fundamental materials properties. However, the surface-initiated decomposition of M n+1 AX n thin films into MX compounds at temperatures of 1000-1100 °C is much lower than the decomposition temperatures typically reported for the corresponding bulk material. We also review the prospects for low-temperature synthesis, which is essential for deposition of MAX phases onto technologically important substrates. While deposition of MAX phases from the archetypical Ti-Si-C and Ti-Al-N systems typically require synthesis temperatures of ~800 °C, recent results have demonstrated that V 2 GeC and Cr 2 AlC can be deposited at ~450 °C. Also, thermal spray of Ti 2 AlC powder has been used to produce thick coatings. We further treat progress in the use of first-principles calculations for predicting hypothetical MAX phases and their properties. Together with advances in processing and materials 3 analysis, this progress has led to recent discoveries of numerous new MAX phases such as Ti 4 SiC 3 , Ta 4 AlC 3 , and Ti 3 SnC 2 . Finally, important future research directions are discussed. These include charting the unknown regions in phase diagrams to discover new equilibrium and metastable phases, as well as research challenges in understanding their physical properties, such as the effects of anisotropy, impurities, and vacancies on the electrical properties, and unexplored properties such as superconductivity, magnetism, and optics. 4

show abstract

Correlation between electron and negative O− ion emission during reactive sputtering of oxides

Cited by 65 publications

References 17 publications

Carrier transport in polycrystalline ITO and ZnO:Al II: The influence of grain barriers and boundaries

Carrier transport in polycrystalline ITO and ZnO:Al II: The influence of grain barriers and boundaries

Sputter Deposition Processes

The M+1AX phases: Materials science and thin-film processing

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