Correlation between diffraction patterns and surface morphology to the model of oxygen diffusion into ITO films

Preparation of non-annealed anatase TiO2 film on ITO substrate by anodizing in hot phosphate/glycerol electrolyte for dye-sensitized solar cells

“…However, the TCO substrates are heat-labile materials, leading to an increase in the electric resistance [11,12].…”

Effects of annealing conditions on the properties of TiO2/ITO-based photoanode and the photovoltaic performance of dye-sensitized solar cells

“…The increase of resistivity is attributed to the decrease of oxygen vacancies in the ITO film [4,6,7]. During annealing, the oxygen atoms in the air diffuse into the ITO film and occupy the oxygen vacancies.…”

Development of luminescent europium-based phosphor films

“…For example, the phosphor materials are used in many photonic applications, such as electronic display devices [1][2], optoelectronic devices [1][2][3], fluorescent lamps [1][2][3][4] and so on. For practical applications, the phosphor materials should have high emission efficiency and consume less power [1][2][3][4][5]. Yttrium oxide doped with europium ions (Y 2 O 3 :Eu 3+ ) is a well-known red-emitting phosphor material with the peak emission wavelength at about 613nm ( 5 D 0 -7 F 2 emission transition).…”

“…However, the emission efficiency of Y 2 O 3 :Eu 3+ phosphor films is still low. In general, the low efficiency of phosphor films is associated with the process conditions, the composition of materials, and the morphology of films [1][2][3][4][5][6], [1][2][3][4][5][6][7]. Hence, considerable efforts have been devoted to increase the efficiency of Y 2 O 3 :Eu 3+ phosphor films in the last few years [1][2][3][4][5][6][7][8]- [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15].…”

“…Developing the process conditions is necessary for each preparation method because only the phosphor films prepared in optimum process conditions can achieve highest efficiency. The Y 2 O 3 :Eu 3+ phosphor films have been prepared by using the deposition method such as pulsed laser deposition [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16]- [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19], sputtering [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15]…”