2014
DOI: 10.1016/j.apsusc.2013.10.008
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Correlation between contact surface and friction during the optical glass polishing

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Cited by 45 publications
(24 citation statements)
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“…And many researches have been done on this factor in several kinds of polishing technologies. Belkhir et al [1] proved that it is very important to control the contact pressure and the polisher form according to the pressure distribution in order to guarantee a very high quality of the polished surface. Yang et al [2] built the pressure and velocity dependence of the material removal rate (MRR) in the fast polishing process (FPP) based on the direct contact between the wafer and the pad.…”
Section: Introductionmentioning
confidence: 99%
“…And many researches have been done on this factor in several kinds of polishing technologies. Belkhir et al [1] proved that it is very important to control the contact pressure and the polisher form according to the pressure distribution in order to guarantee a very high quality of the polished surface. Yang et al [2] built the pressure and velocity dependence of the material removal rate (MRR) in the fast polishing process (FPP) based on the direct contact between the wafer and the pad.…”
Section: Introductionmentioning
confidence: 99%
“…They determined microscopic basic courses such as approaching, contact, indentation and pull-out of abrasive particles on optical surfaces [1][2][3], in turn they determined outcomes of polishing directly.…”
Section: Introductionmentioning
confidence: 99%
“…The critical cutting depth of the material is extremely small. When the instantaneous cutting depth of the abrasive grains did not reach the critical cutting depth, the material is removed by plastic deformation [3]. When the instantaneous cutting depth of the abrasive grains reached beyond the critical cutting depth, micro cracks are generated inside the material, as the micro cracks propagates onto the machined surfaces, the material was removed by brittle fracture [4] and powdering [5,6].…”
Section: Introductionmentioning
confidence: 99%