Correlation between CF2 and CxFy densities in C4F8 plasmas

Sasaki, Koichi; Takizawa, Kayoko; Kadota, K.

doi:10.1016/s0040-6090(00)01158-5

Cited by 20 publications

(14 citation statements)

References 29 publications

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“…Many experimental results have been reported where the C 2 F 4 molecule is the main component and a CF 2 radical may be subsequently produced in c-C 4 F 8 plasmas. [1][2][3][4][5][6][7][8] Primitive computational calculations had been carried out to predict the dissociation paths, [9][10][11] however, the dissociative excited states were not specified and the dissociation mechanism was still uncertain. We also tried to estimate the dissociation channels tentatively using the configuration interaction singles (CIS) calculation method and found that the main dissociation channel was excitation to the S 4 ( 1 2E) state composed of transitions from the highest occupied molecular orbital with a symmetry of b 1 to degenerate e unoccupied molecular orbitals (consisting of antibonding combination of C 2 F 4 π-bonding orbitals).…”

Section: Introductionmentioning

confidence: 99%

Dissociation channels of c-C₄F₈ to C₂F₄ in reactive plasma

Hayashi¹,

Ishikawa²,

Iwayama³

et al. 2022

Jpn. J. Appl. Phys.

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Section: Introductionmentioning

confidence: 99%

Dissociation channels of c-C₄F₈ to C₂F₄ in reactive plasma

Hayashi¹,

Ishikawa²,

Iwayama³

et al. 2022

Jpn. J. Appl. Phys.

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“…may play a synergic role for certain aspects of the etch process, such as polymerization, chemical etching, and physical sputtering. [35][36][37][38][39][40] Therefore, in this paper, we study in detail the dissociation and ionization mechanisms of a C 4 F 8 inductively coupled plasma (ICP) in a wide range of discharge conditions, focusing on the fragmentation structure, i.e., the total dissociation degree, the density ratios of ions vs. neutrals and of F vs. C x F y , and the fractions of various fc neutrals and ions. The structure of the paper is as follows.…”

Section: Introductionmentioning

confidence: 99%

Bulk plasma fragmentation in a C4F8 inductively coupled plasma: A hybrid modeling study

Zhao

Zhang

Gao

et al. 2015

Journal of Applied Physics

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A hybrid model is used to investigate the fragmentation of C 4 F 8 inductive discharges. Indeed, the resulting reactive species are crucial for the optimization of the Si-based etching process, since they determine the mechanisms of fluorination, polymerization, and sputtering. In this paper, we present the dissociation degree, the density ratio of F vs. C x F y (i.e., fluorocarbon (fc) neutrals), the neutral vs. positive ion density ratio, details on the neutral and ion components, and fractions of various fc neutrals (or ions) in the total fc neutral (or ion) density in a C 4 F 8 inductively coupled plasma source, as well as the effect of pressure and power on these results. To analyze the fragmentation behavior, the electron density and temperature and electron energy probability function (EEPF) are investigated. Moreover, the main electron-impact generation sources for all considered neutrals and ions are determined from the complicated C 4 F 8 reaction set used in the model. The C 4 F 8 plasma fragmentation is explained, taking into account many factors, such as the EEPF characteristics, the dominance of primary and secondary processes, and the thresholds of dissociation and ionization. The simulation results are compared with experiments from literature, and reasonable agreement is obtained. Some discrepancies are observed, which can probably be attributed to the simplified polymer surface kinetics assumed in the model.

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“…On the other hand, experimental studies of C 4 F 8 -containing plasmas have been conducted, revealing the gas phase reactions related to the cross sections of electron impact, the interactions of species produced in plasma with the surfaces of the reactor, the densities of fluorocarbon radicals, and the relationships between those densities and the operating conditions such as power and pressure. [10][11][12][13][14][15][16][17] There are differences in the predominant CF x radical and the main sources (gas phase or surface reactions) of fluorocarbon radicals by the difference in operating conditions, such as power, pressure and type of dilution gas.…”

Section: Introductionmentioning

confidence: 99%

Comparison of Plasma Parameters Measured in Inductively Coupled Ar/C₄F₈/O₂and Ar/CF₄/O₂Plasmas

Kimura

Hanaki

2009

Jpn. J. Appl. Phys.

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The properties of inductively coupled Ar/C 4 F 8 /O 2 and Ar/CF 4 /O 2 plasmas are investigated at two total pressures of 15 and 30 mTorr. Measurements using a Langmuir probe and optical emission spectroscopy are carried out, while varying the ratio of the oxygen fraction to the sum of fluorocarbon and oxygen fractions (R OC ) at an Ar fraction higher than 70%. The measured electron energy probability functions slightly deviate from the Maxwellian distribution owing to the depletion of electrons with an energy higher than 10 eV. The electron density measured in the Ar/C 4 F 8 /O 2 plasmas gradually decreases with increasing R OC and reaches a minimum at R OC 0:3, whereas that in the Ar/CF 4 /O 2 plasmas does not strongly depend on R OC . The density of CF 2 radicals in the Ar/C 4 F 8 /O 2 plasmas markedly decreases in the range of 0:2 R OC 0:4, whereas that of oxygen atoms in the Ar/C 4 F 8 /O 2 plasmas more sharply increases with increasing R OC compared with that of oxygen atoms in the Ar/CF 4 /O 2 plasmas. The density of fluorine atoms measured in the Ar/C 4 F 8 /O 2 plasmas reaches a minimum at R OC 0:3 { 0:4 and then starts to increase again, whereas that in the Ar/CF 4 /O 2 plasmas has a maximum at R OC 0:2 { 0:3.

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Correlation between CF2 and CxFy densities in C4F8 plasmas

Cited by 20 publications

References 29 publications

Dissociation channels of c-C₄F₈ to C₂F₄ in reactive plasma

Dissociation channels of c-C₄F₈ to C₂F₄ in reactive plasma

Bulk plasma fragmentation in a C4F8 inductively coupled plasma: A hybrid modeling study

Comparison of Plasma Parameters Measured in Inductively Coupled Ar/C₄F₈/O₂and Ar/CF₄/O₂Plasmas

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Correlation between CF2 and CxFy densities in C4F8 plasmas

Cited by 20 publications

References 29 publications

Dissociation channels of c-C4F8 to C2F4 in reactive plasma

Dissociation channels of c-C4F8 to C2F4 in reactive plasma

Bulk plasma fragmentation in a C4F8 inductively coupled plasma: A hybrid modeling study

Comparison of Plasma Parameters Measured in Inductively Coupled Ar/C4F8/O2and Ar/CF4/O2Plasmas

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Dissociation channels of c-C₄F₈ to C₂F₄ in reactive plasma

Dissociation channels of c-C₄F₈ to C₂F₄ in reactive plasma

Comparison of Plasma Parameters Measured in Inductively Coupled Ar/C₄F₈/O₂and Ar/CF₄/O₂Plasmas