Abstract:The relationship between directivity (Δ) and removal rate (RR) during copper chemical mechanical planarization (CMP) was investigated. We measured the high-frequency shear and normal forces generated by stick-slip (which has been routinely used to explain micro-and nano-scale interactions that lead to material removal), and found there to be a strong correlation between Δ (defined as the ratio of variances in shear force to those of normal force) and copper RR so long as the tribological mechanism remained con… Show more
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