Abstract:The increasing number of interconnect layers that are needed in a CMOS process to meet the routing and power requirements of large digital circuits also yield significant advantages for analog applications. The reverse thickness scaling of the top metal layer can be exploited in the design of low-loss transmission lines. Coplanar transmission lines in the top metal layers take advantage of a low metal resistance and a large separation from the heavily doped silicon substrate. They are therefore fully compatibl… Show more
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