Chemical
vapor deposition is a widely used material deposition
technique. It commonly provides a uniform material flux to the substrate
to cause uniform thin film growth. However, the ability to precisely
adjust the local deposition rate would be highly preferable. This
communication reports on a chemical vapor deposition method performed
in a localized and programmable fashion by introducing an electrically
charged and guided molecular flux. This allows for local adjustments
of the deposition rate and three-dimensional shape by controlling
the electric fields. Specifically, the precursor molecules are charged
and then guided by arrays of electrodynamic funnels, which are created
by a patterned dielectric layer, to predetermined deposition locations
with a minimal spot size of 250 nm. Furthermore, nearest neighbor
coupling is reported as a shaping method to cause the deposition of
three-dimensional nanostructures. Additionally, the integration of
individually addressable domain electrodes offers programmable charge
dissipation to achieve an ON/OFF control. The described method is
applicable to a wide variety of materials and precursors. Here, the
localized and programmable deposition of three-dimensional copper
oxide, chromium oxide, zinc oxide, and carbon nanowires is demonstrated.