2013
DOI: 10.1002/pssa.201200798
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Copper–zinc thin films reactively co‐sputtered from a two‐component sectioned cathode

Abstract: Cu-Zn thin film oxide alloys have been fabricated by reactive co-sputter deposition using a sectioned two-component metallic target. A Cu-Zn compositional spread ranging from Cu-88 at.% Zn to Cu-1.3 at.% Zn defining a combinatorial library was identified. A thickness gradient with a maximum of 4.1 mm was found. The microstructure of the Cu-Zn oxide thin films was analyzed by SEM, finding three compositional zones with structural differences. XRD investigations have revealed different crystalline structures for… Show more

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Cited by 4 publications
(3 citation statements)
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“…New materials comprising especially binary and ternary alloys and compounds as well as n ‐component materials can be fabricated in a rapid way or even in a one‐step experiment (). Well‐known techniques in this regard are represented by co‐sputtering and thermal co‐evaporation , which can both be used for preparation of thin film combinatorial material libraries. The most noticeable characteristic of a material library is the composition changing as a function of position on the sample.…”
Section: Introductionmentioning
confidence: 99%
“…New materials comprising especially binary and ternary alloys and compounds as well as n ‐component materials can be fabricated in a rapid way or even in a one‐step experiment (). Well‐known techniques in this regard are represented by co‐sputtering and thermal co‐evaporation , which can both be used for preparation of thin film combinatorial material libraries. The most noticeable characteristic of a material library is the composition changing as a function of position on the sample.…”
Section: Introductionmentioning
confidence: 99%
“…Combinatorial methods have recently become subject of increasing research interest due to their tremendous advantage of accelerated development of materials by means of relatively short time experiments. Apart from methods like co‐sputtering or co‐evaporation , electrodeposition represents a powerful fabrication method to prepare combinatorial material libraries, in which the composition of the deposited alloys change within the sample as a function of the position .…”
Section: Introductionmentioning
confidence: 99%
“…The oxygen partial pressure during deposition was 0.6 Pa. More details about the reactive sputtering from sectioned cathodes were recently reported during the study of a Cu-Zn oxide material library. 27 The overall sputtering time was 190 min. Due to the diameter of the sectioned cathode, the Cu-Ni oxide compositional spread was deposited on two borosilicate glass substrates (Marienfeld microscope slides, 26 Â 76 mm 2 ).…”
Section: Methodsmentioning
confidence: 99%