Copper nitride layers synthesized by pulsed magnetron sputtering

Nowakowska-Langier, Katarzyna; Choduń, Rafał; Minikayev, R.; Okrasa, Sebastian; Strzelecki, Grzegorz W.; Wicher, B.; Zdunek, Krzysztof

doi:10.1016/j.tsf.2017.10.042

Cited by 23 publications

(12 citation statements)

References 37 publications

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“…Modulation frequency, which is one of parameters of PMS process, allows for significant changes to be made in morphology and growth rate of thin films synthesized using this technique through the modification of plasma composition and the manner of how the energy is delivered to the substrate. Plasma composition is directly related to the modulation frequency and as such allows for better control of the synthesis process which leads to extending material design possibilities as has been reported for Cu-N films [11]. Obtained structures were either clearly columnar or exhibited a more fine-grained structure.…”

Section: Discussionmentioning

confidence: 74%

Influence of modulation frequency on the synthesis of thin films in pulsed magnetron sputtering processes

Strzelecki

Nowakowska-Langier

Choduń

et al. 2018

Materials Science-Poland

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The research on the influence of modulation frequency on the properties of films synthesized using a unique pulsed power supply combined with a standard unbalanced circular magnetron was conducted in the process of pulsed magnetron sputtering (PMS). It was shown that by using different levels of modulation, the composition of plasma (measured by optical emission spectroscopy, OES) as well as film growth rate and morphology (observed with scanning electron microscope, SEM), can be changed. The impact of modulation is related to the used materials and gases and can vary significantly. It was concluded that modulation frequency can greatly influence the synthesis of materials and can be used as an additional parameter in PMS. Specific relations between modulation frequency and synthesized material require further investigation.

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Section: Discussionmentioning

confidence: 74%

Influence of modulation frequency on the synthesis of thin films in pulsed magnetron sputtering processes

Strzelecki

Nowakowska-Langier

Choduń

et al. 2018

Materials Science-Poland

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“…The practical range of synthesis of such materials is very narrow and difficult to observe. On the basis of our previous studies [10][11][12], plasma surface engineering could be used to synthesize the metastable Cu 3 N material with reduced thermal activation. In the pulsed magnetron sputtering (PMS) method, the synthesis process is implemented in a pulsed manner, which enables it to be substituted for different forms of energy during synthesis.…”

Section: Introductionmentioning

confidence: 99%

Synthesis of Copper Nitride Layers by the Pulsed Magnetron Sputtering Method Carried out under Various Operating Conditions

et al. 2021

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Copper nitride shows various properties that depend on the structure of the material and is influenced by the change in technical parameters. In the present work, Cu–N layers were synthesized using the pulsed magnetron sputtering method. The synthesis was performed under different operating conditions: direct current (DC) or alternating current (AC) power supply, and various atmospheres: pure Ar and a mixture of Ar + N2. The structural properties of the deposited layers were characterized by X-ray diffraction measurements, and Raman spectroscopy and scanning electron microscopy have been performed. Optical properties were also evaluated. The obtained layers showed tightly packed columnar grain features. The kinetics of the layer growth in the AC mode was lower than that observed in the DC mode, and the layers were thinner and more fine-grained. The copper nitride layers were characterized by the one-phase and two-phase polycrystalline structure of the Cu3N phase with the preferred growth orientation (100). The lattice constant oscillates between 3.808 and 3.815 Å for one-phase and has a value of 3.828 Å for a two-phase structure. Phase composition results were correlated with Raman spectroscopy measurements. Raman spectra exhibited a broad, diffused, and intense signal of Cu3N phase, with Raman shift located at 628–635 cm−1. Studies on optical properties showed that the energy gap ranged from 2.17 to 2.47 eV. The results showed that controlling technical parameters gives a possibility to optimize the structure and phase composition of deposited layers. The reported changes were discussed and attributed to the properties of the material layers and technology method.

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“…The XRD test pattern of different MoS2 sputtering power composite Cu3N films is shown in Figure 1. The films had the crystallization peaks of Cu3N and MoS2, of which the 2θ values of 23.3°, 33.1°, and 47.6° corresponded to Cu3N (100), (110), and (200) crystal faces, respectively [52,53]. The peak of 2θ = 62.02° corresponded to the MoS2 (107) crystal plane.…”

Section: Resultsmentioning

confidence: 99%

Photocatalytic Properties of Copper Nitride/Molybdenum Disulfide Composite Films Prepared by Magnetron Sputtering

et al. 2020

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Cu3N/MoS2 composite films were prepared by magnetron sputtering under different preparation parameter, and their photocatalytic properties were investigated. Results showed that the composite films surface was uniform and had no evident cracks. When the sputtering power of MoS2 increased from 2 W to 8 W, the photocatalytic performance of the composite films showed a trend of increasing first and then decreasing. Among these films, the composite films with MoS2 sputtering power of 4 W showed the best photocatalytic degradation performance. The photocatalytic degradation rate of methyl orange at 30 min was 98.3%, because the MoS2 crystal in the films preferentially grew over the Cu3N crystal, thereby affecting the growth of the Cu3N crystal. The crystallinity of the copper nitride also increased. During photocatalytic degradation, the proper amount of MoS2 reduced the band gap of Cu3N, and the photogenerated electron hole pairs were easily separated. Thus, the films produces additional photogenerated electrons and promotes the degradation reaction of the composite films on methyl orange solution.

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Copper nitride layers synthesized by pulsed magnetron sputtering

Cited by 23 publications

References 37 publications

Influence of modulation frequency on the synthesis of thin films in pulsed magnetron sputtering processes

Influence of modulation frequency on the synthesis of thin films in pulsed magnetron sputtering processes

Synthesis of Copper Nitride Layers by the Pulsed Magnetron Sputtering Method Carried out under Various Operating Conditions

Photocatalytic Properties of Copper Nitride/Molybdenum Disulfide Composite Films Prepared by Magnetron Sputtering

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