“…These findings are in agreement with previous reports showing the formation of Cu x Te at the ZnTe|CdTe interface. ,,,, Among the Cu–Te phases, the Cu 1.4 Te is the most beneficial for the device performance because of its stability and electrical properties. ,, Unlike the Cu–Te phases with a high Cu/Te ratio (e.g., Cu 2 Te), it has lower probability to decompose to metallic Cu and lower-stoichiometric Cu x Te, creating vacancies which can reduce the mobility of the free carriers in the material . However, with Cu/Te ratio >1.25, both Cu 1.4 x Te structures can cause metallic Cu precipitates as predicted by Da Silva et al, which explains why even when the more stable Cu–Te phases were formed at the back contact, the Cu segregation at the front contact (around the CdTe|CdS) is still observed (Figure c).…”