Cooper, Harry (R.)

Rye, Howard

doi:10.1093/gmo/9781561592630.article.j101400

Cited by 1 publication

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“…14) -16) However, PTFE has poor adhesion properties owing to its low surface energy, which is caused by the abundance of C-F bonds, and it is thus difficult to manufacture a metal wiring pattern with high adhesion to PTFE. 17) , 18) Surface treatment of PTFE is essential to improve the strength of adhesion between a PTFE substrate and a metal wiring pattern. Surface treatment by wet etching involving Na metal has been performed on PTFE as a conventional method, which could improve its adhesion properties for two reasons: the introduc-tion of hydrophilic functional groups onto the PTFE surface via the removal of fluorine atoms by metallic Na and an anchoring effect due to an increase in surface roughness.…”

Section: Introductionmentioning

confidence: 99%

Surface Modification of Fluoropolymer Using Open-Air Plasma Treatment at Atmospheric Pressure with Ar, Ar＋O2, and Ar＋H2 for Application in HighAdhesion Metal Wiring Patterns

Kodama

Ohkubo

Oshita

et al. 2018

Journal of the Surface Finishing Society of Japan

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We performed open-air plasma treatment of polytetrafluoroethylene (PTFE) at atmospheric pressure to increase the adhesion strength between PTFE and an Ag metal film formed from Ag ink. Coloration of the PTFE surface occurred during 600 s treatment with Ar plasma. The Ag/PTFE adhesion strength was 0.06 N/mm. To resolve the problem of coloration and to improve the adhesion strength, O2 or H2 gas was added. During treatment with Ar + O2 plasma with O2 content of 0.33% for 600 s, no coloration occurred but the adhesion strength decreased to zero. During treatment with Ar + H2 plasma for 600 s, coloration did not occur. Moreover, the adhesion strength increased to 0.25-0.55 N/mm. These results showed that H2 addition was effective for preventing coloration and improving adhesion strength during long-period plasma treatment. Furthermore, the uniformity of surface treatment with Ar + H2 plasma was higher than that for Ar plasma.

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Section: Introductionmentioning

confidence: 99%