2015
DOI: 10.1039/c5cp03369a
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Controlling charge injection properties in polymer field-effect transistors by incorporation of solution processed molybdenum trioxide

Abstract: A simply and facilely synthesized MoO3 solution was developed to fabricate charge injection layers for improving the charge-injection properties in p-type organic field-effect transistors (OFETs). By dissolving MoO3 powder in ammonium (NH3) solvent under an air atmosphere, an intermediate ammonium molybdate ((NH4)2MoO4) precursor is made stable, transparent and spin-coated to form the MoO3 interfacial layers, the thickness and morphology of which can be well-controlled. When the MoO3 layer was applied to OFETs… Show more

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Cited by 17 publications
(9 citation statements)
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“…Furthermore, the R c characteristics evolve from dispersive behavior on Au to nondispersive behavior on h 2 , that is, R c becomes independent of I sd and σ; a signature of the true ohmic contact (Figure d). The R c values attained here are superior to those using solution‐processed MoO 3 (120 kΩ cm) with a related DPP polymer in the same OFET configuration . Taking into account the space‐charge resistance of the intervening semiconductor layer, we evaluated ρ c to be 1, 4, and 9 Ω cm 2 for h 2 , h 1 , and bare Au, respectively (Note S5, Supporting Information).…”
Section: Resultsmentioning
confidence: 92%
“…Furthermore, the R c characteristics evolve from dispersive behavior on Au to nondispersive behavior on h 2 , that is, R c becomes independent of I sd and σ; a signature of the true ohmic contact (Figure d). The R c values attained here are superior to those using solution‐processed MoO 3 (120 kΩ cm) with a related DPP polymer in the same OFET configuration . Taking into account the space‐charge resistance of the intervening semiconductor layer, we evaluated ρ c to be 1, 4, and 9 Ω cm 2 for h 2 , h 1 , and bare Au, respectively (Note S5, Supporting Information).…”
Section: Resultsmentioning
confidence: 92%
“…The bottom contact electrodes were fabricated by sputtering Ni/Mo (3/13 nm) and conventional photolithography process to define patterns for source and drain electrodes. For the MoO 3 interlayers, the ammonium molybdate (NH 4 ) 2 MoO 4 in H 2 O solution (0.8 wt% of MoO 3 ) was spin-coated and annealed at 150 °C for 10 min in air 30 . For V 2 O 5 interlayers, the ammonium vanadate ((NH 4 ) 3 VO 4 ) solution of different concentration (0.1–0.5 wt% of V 2 O 5 ) was spin-coated and then annealed at 150 °C for 20 min in air 23 .…”
Section: Methodsmentioning
confidence: 99%
“…Furthermore, we attempted to modify the Au source/drain electrodes by doping NaHCO 3 , in order to look into the possibility of an n-type unipolar device, which is essential for a p-n junction with a complementary device due to the defects of ambipolar devices derived from the opposing charge flows. [66][67][68][69] For increasing the positive voltage, the hole transport in the ambipolar devices increased the off current and operated as a leakage current in electron transport. For increasing the negative voltage, the electrons acted as a barrier to the hole transport, consequently reducing the on/off characteristics of the devices and the accuracy in extracting the mobility and threshold voltage.…”
Section: Electrical Characterization and Performance Of Ofetsmentioning
confidence: 99%