“…11,12 Additionally, the use of MOFs as supports allows for loading higher density of isolated metal single sites compared to what can be achieved with typical catalyst supports, where limited loading in the latter case is essential to prevent sintering during reactions. [12][13][14][15] As an example, between 1.6 and 2 wt% of atomically dispersed Cu can be loaded into the UiO-66 framework, 16,17 compared to #0.05 wt% on CeO 2 -TiO 2 supports needed to ensure atomic dispersion of the loaded metal. 11,12,16 This enhances the gravimetric and volumetric density of these catalysts which is necessary for their practical applications, where size and mass of the reactor are decisive.…”