Controlled wavelength reduction in surface wrinkling of poly(dimethylsiloxane)

Park, Jeong Yong; Chae, Hee Young; Chung, Chan‐Hwa; Sim, Sang Jun; Park, Juhyun; Lee, Hong H.; Yoo, Pil J.

doi:10.1039/b916603c

Cited by 59 publications

(54 citation statements)

References 28 publications

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“…Wrinkled surfaces were fabricated using mechanical compression of a poly(dimethylsiloxane) (PDMS) that has been treated with UV-ozone (UVO) following previous reports [19,20,31,32]. The PDMS elastomer (Sylgard 184) was prepared using a 20:1 ratio by mass of resin to curing agent.…”

Section: Methodsmentioning

confidence: 99%

Slip-stick wetting and large contact angle hysteresis on wrinkled surfaces

Bukowsky

Torres

Vogt

2011

Journal of Colloid and Interface Science

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Section: Methodsmentioning

confidence: 99%

Slip-stick wetting and large contact angle hysteresis on wrinkled surfaces

Bukowsky

Torres

Vogt

2011

Journal of Colloid and Interface Science

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“…PDMS readily undergoes surface oxidation and vitrification via plasma exposure or UV ozonolysis (UVO) [37][38][39][40] , yielding a high modulus (∼ GPa 41 ) silica-like layer. While UVO exposure yields glassy skins of approximate 1-10 µm thickness, 38,42,43 oxygen or air plasmas generally lead to much thinner films, of the order of a few to tens of nm.…”

Section: Introductionmentioning

confidence: 99%

Sub-100 nm wrinkling of polydimethylsiloxane by double frontal oxidation

et al. 2017

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We demonstrate nanoscale wrinkling on polydimethylsiloxane (PDMS) at sub-100 nm length scales via a (double) frontal surface oxidation coupled with a mechanical compression. The kinetics of the glassy skin propagation is resolved by neutron and X-ray reflectivity, and atomic force microscopy, combined with mechanical wrinkling experiments to evaluate the resulting pattern formation. In conventional PDMS surface oxidation, the smallest wrinkling patterns attainable have an intrinsic lower wavelength limit due to the coupling of skin formation and front propagation at fixed strain ε prestrain , whose maximum is, in turn, set by material failure. However, combining two different oxidative processes, an ultra-violet ozonolysis followed by air plasma exposure, we break this limit by fabricating trilayer laminates with excellent interfacial properties and a sequence of moduli and layer thicknesses able to trivially reduce the surface topography to sub-100 nm dimensions. This method provides a powerful, yet simple, non-lithographic approach to extend surface patterning from visible to the deep UV range.

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“…During the OP treatment, the PDMS surface is oxidized and converted into a rigid thin silicate-like (SiO x ) layer, which has been well characterized previously [29][30][31]. Consequently, the film/ substrate system composed of the SiO x /PDMS bilayer is formed with the thickness and modulus of the oxidized layer being dependent on the OP exposure time (t OP ) [32].…”

Section: Resultsmentioning

confidence: 99%

“…It is known that PDMS is a siloxane polymer comprising Si-O-Si backbones. During OP exposure, carbon and hydrogen are etched and oxidized SiO x is formed at the same time [29][30][31]. With respect to the grooves and ridges of the stamp with the line-tospace geometry, they should be etched simultaneously with the same velocity.…”

Section: Resultsmentioning

confidence: 99%