2018
DOI: 10.21685/2307-5538-2018-2-6
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Controlled Synthesis of Thin Films Obtained by Magnetron Sputtering Technique

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Cited by 2 publications
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“…Sampling of targets for experiments, such as cobalt and zirconium, resulted from the fact that the material has high ratio Vm/Vo and has high wear resistance and hardness at high temperatures (tmelt -1493 °С). Practice of use of various targets has shown that application of such materials as cobalt is well correlated in the field of researches of resistive switching over in memristor structures [5][6][7][8][9]. Process of deposition of cobalt and zirconium films is characterized by the following control effects: pressure of working gas P, temperature from substrate T and a discharge current I, distance substrate-target D, i.e.…”
Section: Methodsmentioning
confidence: 99%
“…Sampling of targets for experiments, such as cobalt and zirconium, resulted from the fact that the material has high ratio Vm/Vo and has high wear resistance and hardness at high temperatures (tmelt -1493 °С). Practice of use of various targets has shown that application of such materials as cobalt is well correlated in the field of researches of resistive switching over in memristor structures [5][6][7][8][9]. Process of deposition of cobalt and zirconium films is characterized by the following control effects: pressure of working gas P, temperature from substrate T and a discharge current I, distance substrate-target D, i.e.…”
Section: Methodsmentioning
confidence: 99%
“…Одной из востребованных областей применения электрохромных пленок оксидов металлов и ЭХУ является производство оконного стекла, где важно обеспечить сохранение или отвод тепла, приходящего от солнечного света [40]. Из наиболее популярных методов получения таких пленок магнетронное напыление является трудоемким и дорогостоящим [41,42], а золь-гель технология [30,31,41] отличается простотой, чистотой и однородностью исходных веществ и приемлемой скоростью проведения синтеза. В связи с этим для исследования выбран золь-гель метод синтеза электрохромных пленок WO 3 , основанный на использовании перекиси водорода (пероксидный метод) [30,31,41,43].…”
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