Controlled roughness reduction of patterned resist polymers using laser-induced sub-millisecond heating

Jung, Byungki; Ober, Christopher K.; Thompson, Michael O.

doi:10.1039/c4tc01548g

Cited by 5 publications

(5 citation statements)

References 22 publications

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“…After the heat treatment beyond 50°C, the porous polymeric cover on the MCF observed at Figure 3d was also transformed into a smooth surface 50 . The smoothened surface upon heating (Figure 6j) was attributed to the conformation of polymer chains beyond the glass transition temperature 1,56 …”

Section: Resultsmentioning

confidence: 98%

“…50 The smoothened surface upon heating (Figure 6j) was attributed to the conformation of polymer chains beyond the glass transition temperature. 1,56 Special attention was given to the balanced fractions referred as 50/50. Although type of the nanofibers being m-phase or x-phase were not distinguishable in the SEM images of the pristine fibers (not shown here), the heat treatment resulted in different morphologies in the vicinity and on the surface of the MCFs (Figures 5e,f and 6e,f).…”

Section: Morphology Of Particle-dualpolymeric Hybrid Systemsmentioning

confidence: 99%

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Morphology evolution of self‐same nanocomposites hybridized with jumbo‐sized particles

Arpatappeh

Manga

Bilge

et al. 2022

J of Applied Polymer Sci

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This article reports the production, morphological analyzes, and application of electrospun self‐same nanocomposites with milled carbon fibers (MCFs). The new hybridized structure was also incorporated into conventional fiber reinforced epoxy composites with improved properties. The MCF‐hybridized polymeric nonwoven mats were formed with the simultaneous dual electrospinning of a soften‐able (m‐phase) and a crosslink‐able (x‐phase) variants of poly(styrene‐co‐glycidyl methacrylate). The morphology of the hybrid material was investigated using scanning electron microscopy (SEM). The results showed that electrospinning can successfully deposit reinforcing particles of giant size (MCFs are 7 μm in diameter, 50 μm to 3 mm in length) compared to the diameter of the carrier nanofibers (nanometers). The new hybrid structure preserved the fibrous morphology of the polymer phases up to 250°C. The overall morphology of the hybrid composite was tunable by changing the fractions of the two polymeric phases. The particle‐polymer hybrid structures created morphologies that might find applications in various areas such as the interlayer toughening of laminated composites. It was shown that m‐phase/MCF@x‐phase nonwoven integrated into epoxy matrix composite laminates as interlayer, increased the strain at failure and ultimate strength under tensile loading by 11% and 9%, respectively.

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Section: Resultsmentioning

confidence: 98%

Section: Morphology Of Particle-dualpolymeric Hybrid Systemsmentioning

confidence: 99%

Morphology evolution of self‐same nanocomposites hybridized with jumbo‐sized particles

Arpatappeh

Manga

Bilge

et al. 2022

J of Applied Polymer Sci

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“…The dramatically reduced area required for such combinatorial annealing studies can be coupled with other area-based combinatorial techniques to, for example, evaluate thermally induced phase formation over ternary compositional spreads. The lgLSA technique is based upon laser spike annealing (LSA), which was originally developed to activate dopants in silicon 11,12 but has recently also shown promise in photolithography 13 and directed self-assembly. 14 In LSA, a linefocused laser beam (typical aspect ratio 10:1 to 100:1) is scanned to locally heat a sample (Figure 1a), with temperature profiles determined by the laser intensity profile (Figure 1b), sample absorption, substrate thermal conductivity, and scan velocity.…”

Section: ■ Introductionmentioning

confidence: 98%

“…The lgLSA technique is based upon laser spike annealing (LSA), which was originally developed to activate dopants in silicon , but has recently also shown promise in photolithography and directed self-assembly . In LSA, a line-focused laser beam (typical aspect ratio 10:1 to 100:1) is scanned to locally heat a sample (Figure a), with temperature profiles determined by the laser intensity profile (Figure b), sample absorption, substrate thermal conductivity, and scan velocity.…”

Section: Introductionmentioning

confidence: 99%

Lateral Temperature-Gradient Method for High-Throughput Characterization of Material Processing by Millisecond Laser Annealing

et al. 2016

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A high-throughput method for characterizing the temperature dependence of material properties following microsecond to millisecond thermal annealing, exploiting the temperature gradients created by a lateral gradient laser spike anneal (lgLSA), is presented. Laser scans generate spatial thermal gradients of up to 5 °C/μm with peak temperatures ranging from ambient to in excess of 1400 °C, limited only by laser power and materials thermal limits. Discrete spatial property measurements across the temperature gradient are then equivalent to independent measurements after varying temperature anneals. Accurate temperature calibrations, essential to quantitative analysis, are critical and methods for both peak temperature and spatial/temporal temperature profile characterization are presented. These include absolute temperature calibrations based on melting and thermal decomposition, and time-resolved profiles measured using platinum thermistors. A variety of spatially resolved measurement probes, ranging from point-like continuous profiling to large area sampling, are discussed. Examples from annealing of III-V semiconductors, CdSe quantum dots, low-κ dielectrics, and block copolymers are included to demonstrate the flexibility, high throughput, and precision of this technique.

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“…22 Beyond self-assembly of block copolymers, LSA was used to control CD and linewidth roughness. 23 For 11nm half-pitch resolutions, the International Technology Roadmap for Semiconductors suggests a control of CD and linewidth roughness to o1 and 0.9 nm, respectively. Three commercially available resists were investigated including an acrylate-based polymer and two hybrid polymers (copolymers containing both poly(hydroxystyrene).…”

Section: Exploring Self-assembly Of Block Copolymersmentioning

confidence: 99%

In pursuit of Moore’s Law: polymer chemistry in action

Kosma

Giannelis³

et al. 2017

Polym J

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We present a focused review of photoresist strategies that have been studied over the past few decades driven by the demands of Moore's law. Selected results are discussed with emphasis on the choice of photoresist chemistry depending on the particulars of each radiation type or patterning strategy, while we present special architectures of photoresists that have attracted a great interest in the semiconductor field. We adopt an approach that allows for easy comparison between the different photoresist categories and we include brief discussions of a number of important preparation and property issues pertaining to key characteristics affecting resist performance. Polymer Journal (2018) 50, 45-55; doi:10.1038/pj.2017.64; published online 1 November 2017Photoresists are a workhorse tool for the semiconductor industry; they enable creation of small-scale structures using continuously evolving strategies to form objects of the nanoscale dimensions are needed to stay on the technology path of Moore's law. Simply put, photoresists transfer information using a light-driven process that makes them (often a polymer) either more or less soluble in the exposed region of the film. As dimensions have changed, so too have the chemistry and materials sets used in lithography. Originally requiring critical features of microns, photoresists such as cyclized polyisoprene were used. 1 Subsequently, novolac photoresists were developed and formed a water-soluble exposed material, avoiding the need for organic solvents that swelled the photoresist during development while operating at a shorter wavelength than prior resists, thus enabling smaller, more uniform features. 2 The creation of novolac resists set up a trend in photoresist design: a water developable material, working at a shorter and shorter wavelength to enable a finer feature size and adjusted composition to maintain sufficient transparency for pattern formation. This approach has carried forward through several generations of photoresists built around the principle of chemical amplification.A team of researchers with expertise in photoresists, polymersupported chemistry and protein synthesis worked at the IBM Almaden Research (San Jose, CA, USA) to tackle a new challenge in photolithography: to develop a photoresist that needed very little radiation to cause the solubility change needed during the patterning step. 3 Their concern was that the mercury light source being used to create UV radiation was increasingly weak as shorter wavelengths were used. Hence, a new process was needed that made better use of the imaging radiation.By using acid catalysis driven by a proton created in a light-induced decomposition of a photoacid generator, a single photon was shown to initiate hundreds of reactions. The resulting chemical amplification caused by that single photon was shown to overcome the limited radiation present in light sources of the time. However, the process also did something else arguably more important; it enabled a solubility change from the oil-soluble polymer ...

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Controlled roughness reduction of patterned resist polymers using laser-induced sub-millisecond heating

Abstract: High resolution resist polymers are critical for nanometer-scale lithography. Annealing developed polymer patterns with laser-induced heating at temperatures up to 450 °C for 500 μs minimizes surface energy and reduces pattern roughness.

Cited by 5 publications

References 22 publications

Morphology evolution of self‐same nanocomposites hybridized with jumbo‐sized particles

Morphology evolution of self‐same nanocomposites hybridized with jumbo‐sized particles

Lateral Temperature-Gradient Method for High-Throughput Characterization of Material Processing by Millisecond Laser Annealing

In pursuit of Moore’s Law: polymer chemistry in action

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