2017
DOI: 10.1088/1361-6463/aa8356
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Controlled reactive HiPIMS—effective technique for low-temperature (300 °C) synthesis of VO2films with semiconductor-to-metal transition

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Cited by 41 publications
(28 citation statements)
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“…However, all these techniques are restricted by the cost and scale of vacuum systems. Moreover, most of these growth techniques, although they are of high fidelity and can produce good quality thermochromic VO 2 films, demand high deposition temperatures (>400 • C) [11,[14][15][16][17][18], with very few employing sputtering techniques between 250 and 300 • C [12,13,[19][20][21], making it impossible to utilize flexible (polymeric) substrates.Another approach, called the ex-situ approach [22], to the fabrication of VO 2 thermochromic films is to first synthesize the desired material as a powder and then to deposit the material as a film onto the desired surface. Thermochromic VO 2 in the form of powders have been synthesized by various methods, such as thermolysis [23,24], rapid thermal annealing [25], pyrolysis [26], and, the most utilized method, hydrothermal (solvothermal) synthesis [27][28][29][30][31].…”
mentioning
confidence: 99%
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“…However, all these techniques are restricted by the cost and scale of vacuum systems. Moreover, most of these growth techniques, although they are of high fidelity and can produce good quality thermochromic VO 2 films, demand high deposition temperatures (>400 • C) [11,[14][15][16][17][18], with very few employing sputtering techniques between 250 and 300 • C [12,13,[19][20][21], making it impossible to utilize flexible (polymeric) substrates.Another approach, called the ex-situ approach [22], to the fabrication of VO 2 thermochromic films is to first synthesize the desired material as a powder and then to deposit the material as a film onto the desired surface. Thermochromic VO 2 in the form of powders have been synthesized by various methods, such as thermolysis [23,24], rapid thermal annealing [25], pyrolysis [26], and, the most utilized method, hydrothermal (solvothermal) synthesis [27][28][29][30][31].…”
mentioning
confidence: 99%
“…However, all these techniques are restricted by the cost and scale of vacuum systems. Moreover, most of these growth techniques, although they are of high fidelity and can produce good quality thermochromic VO 2 films, demand high deposition temperatures (>400 • C) [11,[14][15][16][17][18], with very few employing sputtering techniques between 250 and 300 • C [12,13,[19][20][21], making it impossible to utilize flexible (polymeric) substrates.…”
mentioning
confidence: 99%
“…Keeping the RF sputtering power constant, the increase in PDC is synonymous with the increase in on‐time in which the ions are accelerated. As a consequence, changing the PDC value will affect the energy distribution, species, and cross sections of dominant primary ions and, as a consequence, the properties of the secondary target particles can be manipulated . Thus, inter alia, the timescale for ordering at the substrate surface is modified.…”
Section: Resultsmentioning
confidence: 99%
“…Doped VO 2 is commonly prepared by hydrothermal synthesis [6], chemical vapour deposition [14], magnetron sputtering [15], sol-gel synthesis [16], etc. Although these methods usually require long-lasting thermal treatment at high temperatures in an inert atmosphere, VO 2 films can be successfully prepared by fairly low temperature magnetron sputtering depositions [17][18][19][20]. Nevertheless, VO 2 can be prepared by means of facile wet-chemistry synthesis through intermediate vanadyl glycolate, VO(OCH 2 CH 2 O), thus enabling short annealing times and avoiding inert atmosphere requirements [21].…”
Section: Introductionmentioning
confidence: 99%