The
effect of long-wavelength ultraviolet photo-cross-linking on
microphase-separated coumarin-containing block polymers was studied
by photorheometry and small-angle X-ray scattering. This model system
consisted of three photo-cross-linkable diblock polymers of poly(methoxyethyl
acrylate)-b-poly(hexyl methacrylate-co-coumarin methacrylate) with different volume fractions of the cross-linkable
coumarin-containing block, which microphase separated into lamellar
and cylindrical morphologies. All polymers stiffened upon exposure
to 365 nm light, with much greater relative increases in moduli recorded
for lamellae-forming polymers (ca. 3200% increase) compared to the
cylinder-forming polymer (ca. 550% increase). Disordering transitions
that were evident in un-cross-linked samples were no longer observed
after cross-linking in the ordered state, and domain sizes were found
to remain stable to heating. The photo-cross-linking reaction only
proceeded under active irradiation (i.e., cross-linking does not persist
when the UV radiation is turned off), indicating a high degree of
spatiotemporal control over curing in this system. Finally, at constant
concentration of couamarin within the cross-linkable block, the cure
rate was largely independent of polymer composition, suggesting a
constant local concentration of coumarin moieties within the segregated
cross-linkable domains. These findings establish a set of specific
structure–property relationships governing the phase-selective
photo-cross-linking of diblock polymers that can guide the design
of robust nanostructured materials.