2015
DOI: 10.1038/srep18596
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Controllable Growth of Large–Size Crystalline MoS2 and Resist-Free Transfer Assisted with a Cu Thin Film

Abstract: Two-dimensional MoS2 is a promising material for future nanoelectronics and optoelectronics. It has remained a great challenge to grow large-size crystalline and high surface coverage monolayer MoS2. In this work, we investigate the controllable growth of monolayer MoS2 evolving from triangular flakes to continuous thin films by optimizing the concentration of gaseous MoS2, which has been shown a both thermodynamic and kinetic growth factor. A single-crystal monolayer MoS2 larger than 300 μm was successfully g… Show more

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Cited by 185 publications
(189 citation statements)
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References 48 publications
(76 reference statements)
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“…The prospects for commercialization will depend on device reliability and means for low-cost and large-volume production. The growth of TMD monolayers has made large progress in recent years [117][118][119][120][121][122][123][124][125][126], but routes to control the chemical doping are still to be devised. Direct growth on plastic substrates does not seem feasible.…”
Section: Discussionmentioning
confidence: 99%
“…The prospects for commercialization will depend on device reliability and means for low-cost and large-volume production. The growth of TMD monolayers has made large progress in recent years [117][118][119][120][121][122][123][124][125][126], but routes to control the chemical doping are still to be devised. Direct growth on plastic substrates does not seem feasible.…”
Section: Discussionmentioning
confidence: 99%
“…There is great progress and it is possible to grow single layer high quality flakes with up to 300 µm in size covering a cm-sized substrate surface [117] . It is still challenging to avoid large gradients across the substrate and to grow homogenously connected single layer films with high crystal quality [19] .…”
Section: Fabricationmentioning
confidence: 99%
“…[22,23] To date, most of the MoS 2 films have been deposited on silicon dioxides [24] or sapphires and manually transferred to the p-Si substrates [25][26][27] to form HER catalysts. [22,23] To date, most of the MoS 2 films have been deposited on silicon dioxides [24] or sapphires and manually transferred to the p-Si substrates [25][26][27] to form HER catalysts.…”
mentioning
confidence: 99%